Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.56 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.48 |
| ▸ | ATM | Q13315 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | USP2 | O75604 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.47 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | CA7 | P43166 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29493114 | 1.00 | ALDH1A1 (0.56) | ALDH1A1BCL2L1L3MBTL1ATMTDP1 | |
| SCHEMBL8935427 | 0.88 | ALDH1A1 (0.65) | ALDH1A1L3MBTL1ATMTDP1SRD5A2 | |
| SCHEMBL28318689 | 0.85 | GAA (0.56) | ALDH1A1BCL2L1L3MBTL1ATMTDP1 | |
| SCHEMBL29557032 | 0.85 | GAA (0.56) | ALDH1A1L3MBTL1ATMTDP1SRD5A2 | |
| SCHEMBL78196 | 0.85 | GAA (0.56) | ALDH1A1L3MBTL1ATMTDP1SRD5A2 | |
| SCHEMBL8923912 | 0.84 | SELL (0.55) | ALDH1A1BCL2L1SRD5A2MEN1KMT2A | |
| SCHEMBL21935540 | 0.83 | SELL (0.44) | ALDH1A1TDP1LMNACA12CA1 | |
| SCHEMBL27973573 | 0.82 | ALDH1A1 (0.47) | ALDH1A1BCL2L1L3MBTL1MEN1KMT2A | |
| SCHEMBL9187267 | 0.82 | LMNA (0.61) | ALDH1A1L3MBTL1TDP1SRD5A2MEN1 | |
| SCHEMBL30550350 | 0.82 | ALDH1A1 (0.56) | ALDH1A1BCL2L1L3MBTL1ATMTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5427888-A | Positive photosensitive resin composition comprising a polymer having carbon-carbon double bonds, a maleic acid group and a maleimide group | NIPPON OIL CO., LTD. (JP) | 1995-06-27 | — | — | US | claimed |
| US-5411836-A | Positive type photoresist composition comprising a polymer having carbon-carbon double bonds with a maleic half ester and a maleimide attached to the backbone | NIPPON OIL CO., LTD. (JP) | 1995-05-02 | — | — | US | claimed |
| US-20240270891-A1 | PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN | DIC CORPORATION (JP) | 2024-08-15 | — | — | US | disclosed |
| US-11487204-B2 | Resist material | DIC CORPORATION (JP) | 2022-11-01 | — | — | US | disclosed |
| CN-115181312-A | Window material | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| US-11254778-B2 | Novolak resins and resist materials | DIC CORPORATION (JP) | 2022-02-22 | — | — | US | disclosed |
| EP-2639636-B1 | POSITIVE-TYPE PHOTORESIST COMPOSITION | DAINIPPON INK & CHEMICALS (JP) | 2021-05-19 | — | — | EP | disclosed |
| WO-2020137310-A1 | THERMOSETTING COMPOSITION AND CURED PRODUCT THEREOF | DIC株式会社 | 2020-07-02 | — | — | WO | disclosed |
| US-20200166838-A1 | RESIST MATERIAL | DIC CORPORATION (JP) | 2020-05-28 | — | — | US | disclosed |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | DIC CORPORATION (JP) | 2020-03-03 | — | — | US | disclosed |
| CN-106795258-B | Phenolic hydroxy group resin, preparation method, photonasty or solidification compound, erosion resistant, film, solidfied material and resist lower membrane | DIC株式会社 | 2019-11-08 | — | — | CN | disclosed |
| EP-0855620-B1 | Positive photoresist composition | JSR CORP (JP) | 2002-09-11 | — | — | EP | disclosed |
| US-5942369-A | ALKALI-SOLUBLE NOVOLAK RESIN; ALKALI SOLUBLE ACRYLIC RESIN OF RADICAL-POLYMERIZABLE UNITS CONTAINING A: HYDROXYL GROUP, CARBOXYL GROUP, OR PHENOLIC HYDROXYL GROUP; QUINONEDIAZIDE AND SOLVENT; THICK FILMS AS BUMP FORMING MATERIALS | JSR CORPORATION (JP) | 1999-08-24 | — | — | US | disclosed |
| EP-0855620-A1 | Positive photoresist composition | JSR Corporation (JP) | 1998-07-29 | — | — | EP | disclosed |
| US-5686557-A | Polyamide resin which can be dissolved in alcohol solvent, composition thereof, and method of use thereof | TOMOEGAWA PAPER CO., LTD. (JP) | 1997-11-11 | — | — | US | disclosed |
| EP-0471326-B1 | Positive type photoresist composition | NIPPON OIL CO LTD (JP) | 1995-11-02 | — | — | EP | disclosed |
| US-5427888-A | Positive photosensitive resin composition comprising a polymer having carbon-carbon double bonds, a maleic acid group and a maleimide group | NIPPON OIL CO., LTD. (JP) | 1995-06-27 | — | — | US | disclosed |
| US-5411836-A | Positive type photoresist composition comprising a polymer having carbon-carbon double bonds with a maleic half ester and a maleimide attached to the backbone | NIPPON OIL CO., LTD. (JP) | 1995-05-02 | — | — | US | disclosed |
| EP-0582313-A2 | Positive photosensitive resin composition | NIPPON OIL CO. LTD. (JP) | 1994-02-09 | — | — | EP | disclosed |
| EP-0471326-A1 | Positive type photoresist composition | NIPPON OIL COMPANY, LIMITED (JP) | 1992-02-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11487204-B2 | Resist material | FLNA, AFF1, RXRA | ALDH1A1 2479/4885BCL2L1 1934/4885L3MBTL1 4344/4885 |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | HACL2, ASH2L, HEATR1 | ALDH1A1 67/4885BCL2L1 644/4885L3MBTL1 2095/4885 |
| US-20200166838-A1 | RESIST MATERIAL | FLNA, AFF1, RXRA | ALDH1A1 2479/4885BCL2L1 1934/4885L3MBTL1 4344/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.