SCHEMBL2524372

SCHEMBL2524372

C[Si](C)(C)C(C(N)=O)(C(F)(F)F)[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL347228 0.74
SCHEMBL10897429 0.72 LMNA (0.32)
SCHEMBL1770288 0.66
SCHEMBL8769898 0.65 LMNA (0.35)
SCHEMBL29253962 0.65
Trifluoroacetamide SCHEMBL7739632 0.64
SCHEMBL622355 0.64
Trifluoroacetamide SCHEMBL8526109 0.64
Trifluoroacetamide SCHEMBL27598858 0.64
SCHEMBL435447 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
US-7405168-B2 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMITED (JP) 2008-07-29 US claimed
US-20080076262-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2008-03-27 US claimed
US-7345000-B2 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2008-03-18 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
US-6413785-B1 FORMING RESIN-BOUND, N-PROTECTED ALPHA-HYDRAZINYL ESTER; FORMING IMINE; THEN FORMING SECONDARY UREA; THEN PREPARING COMPOUND BY REMOVING SECONDARY UREA FROM RESIN AND CYCLIZING IT THE PROCTER & GAMBLE CO. 2002-07-02 US claimed
JP-2002503725-A 2002-02-05 JP claimed
EP-1056726-A1 SOLID PHASE SYNTHESIS OF 1-AMINOHYDANTOINS THE PROCTER & GAMBLE COMPANY (US) 2000-12-06 EP claimed
WO-1999042450-A1 SOLID PHASE SYNTHESIS OF 1-AMINOHYDANTOINS THE PROCTER & GAMBLE COMPANY (US) 1999-08-26 WO claimed
JP-3101692-A None JP disclosed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US disclosed
EP-0703221-A1 5 alpha-reductase Inhibitors ELI LILLY AND COMPANY (US) 1996-03-27 EP disclosed
JP-H03101692-A AVERMECTIN-3,4-OXIDE DERIVATIVE USEFUL AS ANTIPARASITIC AGENT AND INSECTICIDE MERCK & CO INC 1991-04-26 JP disclosed
EP-0400978-A2 Avermectin -3,4-oxide derivatives useful as antiparasitic agents and insecticides MERCK & CO. INC. (US) 1990-12-05 EP disclosed