SCHEMBL25475412

SCHEMBL25475412

Cc1ccc(C2(OC(=O)C(C)S)CCNCC2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 4/20 0.38
GABRD O14764 1/20 0.38
GABRA1 P14867 1/20 0.38
GABRB1 P18505 1/20 0.38
GABRA5 P31644 1/20 0.38
GABRA3 P34903 1/20 0.38
GABRA2 P47869 1/20 0.38
GABRB2 P47870 1/20 0.38
GABRA4 P48169 1/20 0.38
MAPT P10636 1/20 0.36
MEN1 O00255 1/20 0.33
CYP2D6 P10635 1/20 0.33
KMT2A Q03164 1/20 0.33
CYP3A4 P08684 1/20 0.32
LPAR1 Q92633 1/20 0.32
MMP3 P08254 1/20 0.32
MMP10 P09238 1/20 0.32
SLC6A2 P23975 1/20 0.31
SLC6A4 P31645 1/20 0.31
SLC6A3 Q01959 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25475408 0.88 DRD2 (0.45) OPRM1MAPTSLC6A2SLC6A4SLC6A3
SCHEMBL25475405 0.88 MME (0.38) OPRM1
SCHEMBL25475413 0.88 OPRM1 (0.35) OPRM1MAPTCYP3A4DRD2DRD4
SCHEMBL25475417 0.87 OPRM1 (0.48) OPRM1DRD3
SCHEMBL25475410 0.84 MMP2 (0.38) OPRM1MMP3SLC6A2SLC6A4SLC6A3
SCHEMBL25475401 0.84 KDM1A (0.33) OPRM1GABRDGABRA1GABRB1GABRA5
SCHEMBL25475411 0.83 NPSR1 (0.38) MAPTMEN1CYP2D6KMT2ACYP3A4
SCHEMBL25475406 0.82 SLC6A2 (0.39) OPRM1MEN1KMT2ASLC6A2SLC6A4
SCHEMBL25475403 0.80 OPRM1 (0.43) OPRM1CYP2D6SLC6A2SLC6A4SLC6A3
SCHEMBL25475399 0.79 OPRM1 (0.39) OPRM1GABRDGABRA1GABRB1GABRA5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed