Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 2/20 | 0.35 |
| ▸ | DRD2 | P14416 | 5/20 | 0.34 |
| ▸ | DRD4 | P21917 | 5/20 | 0.34 |
| ▸ | DRD3 | P35462 | 5/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | AKT1 | P31749 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25475412 | 0.88 | OPRM1 (0.38) | OPRM1DRD2DRD4DRD3MAPT | |
| SCHEMBL25475408 | 0.86 | DRD2 (0.45) | OPRM1DRD2DRD4DRD3MAPT | |
| SCHEMBL25475405 | 0.86 | MME (0.38) | OPRM1AKT1 | |
| SCHEMBL23870808 | 0.86 | OPRM1 (0.35) | OPRM1DRD2DRD4DRD3MAPT | |
| SCHEMBL25475417 | 0.86 | OPRM1 (0.48) | OPRM1DRD3 | |
| SCHEMBL25475410 | 0.86 | MMP2 (0.38) | OPRM1 | |
| SCHEMBL25475407 | 0.85 | ALDH1A1 (0.38) | OPRM1ALDH1A1CYP3A4CYP2C19 | |
| SCHEMBL25475402 | 0.85 | MAPT (0.33) | OPRM1DRD2DRD4DRD3MAPT | |
| SCHEMBL26785474 | 0.83 | MMP3 (0.36) | OPRM1DRD2DRD4DRD3HSD11B1 | |
| SCHEMBL25475411 | 0.82 | NPSR1 (0.38) | MAPTALDH1A1CYP1A2CYP3A4CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161255-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161252-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |