SCHEMBL25527966

SCHEMBL25527966

BCc1ccc(C(=O)OCCS(=O)(=O)O)c(OC(=C)C)c1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 1/20 0.32
▸ SERPINE1 P05121 1/20 0.31
▸ PTGS2 P35354 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25527981 0.91 PTGS2 (0.38) GAASERPINE1PTGS2
SCHEMBL25527986 0.86 ALOX15 (0.43) GAASERPINE1PTGS2
SCHEMBL25527984 0.86 ALOX15 (0.40) GAASERPINE1
SCHEMBL25527965 0.85 KMT2A (0.43) GAA
SCHEMBL25528002 0.84 ESR1 (0.43) GAA
SCHEMBL25528027 0.81 KDM4E (0.30) —
SCHEMBL25527993 0.80 HPGD (0.34) —
SCHEMBL25527941 0.79 SERPINE1 (0.36) GAASERPINE1
SCHEMBL25527912 0.79 SERPINE1 (0.49) GAASERPINE1
SCHEMBL25527923 0.78 KMT2A (0.41) SERPINE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230236503-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-27 — — US disclosed
US-20230152696-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 — — US disclosed
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