Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 7/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 5/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 9/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | P2RX3 | P56373 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25564211 | 0.85 | SLC6A4 (0.40) | SLC6A4SLC6A3EPHX2EPHX1SLC6A2 | |
| SCHEMBL25564206 | 0.84 | CCR1 (0.41) | SLC6A4SLC6A3EPHX2KDM4EALDH1A1 | |
| SCHEMBL25564148 | 0.82 | SLC6A4 (0.49) | SLC6A4SLC6A3EPHX2SLC6A2 | |
| SCHEMBL25564204 | 0.82 | DRD2 (0.41) | ALDH1A1POLB | |
| SCHEMBL25564205 | 0.82 | SLC6A4 (0.43) | SLC6A4SLC6A3EPHX2EPHX1SLC6A2 | |
| SCHEMBL25564249 | 0.81 | SLC6A4 (0.51) | SLC6A4SLC6A3EPHX2EPHX1KDM4E | |
| SCHEMBL25564209 | 0.75 | SLC6A4 (0.43) | SLC6A4SLC6A3EPHX2SLC6A2 | |
| SCHEMBL25564229 | 0.72 | ADORA3 (0.39) | SLC6A4SLC6A3SLC6A2 | |
| SCHEMBL25564288 | 0.71 | ADORA3 (0.40) | SLC6A4SLC6A3SLC6A2 | |
| SCHEMBL25564153 | 0.69 | SLC6A4 (0.37) | SLC6A4SLC6A3EPHX2SLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161254-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |