Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 2/20 | 0.52 |
| ▸ | CA1 | P00915 | 2/20 | 0.52 |
| ▸ | CA2 | P00918 | 2/20 | 0.52 |
| ▸ | CA9 | Q16790 | 2/20 | 0.52 |
| ▸ | CA6 | P23280 | 1/20 | 0.52 |
| ▸ | KMO | O15229 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | UNG | P13051 | 1/20 | 0.47 |
| ▸ | DAO | P14920 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.46 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.46 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.46 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.45 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29411053 | 1.00 | CA12 (0.52) | CA12CA1CA2CA9CA6 | |
| Hydrochloric Acid SCHEMBL4350304 | 0.98 | CA12 (0.50) | CA12CA1CA2CA9CA6 | |
| SCHEMBL13132590 | 0.87 | L3MBTL1 (0.52) | CA12CA1CA2CA9CA6 | |
| SCHEMBL13132758 | 0.87 | L3MBTL1 (0.52) | CA12CA1CA2CA9CA6 | |
| SCHEMBL3839084 | 0.85 | TDP1 (0.52) | CA12CA1CA2CA9FFAR1 | |
| SCHEMBL1637630 | 0.84 | ATM (0.63) | HPGDHSD17B10KMT2A | |
| SCHEMBL28867108 | 0.84 | CES2 (0.54) | CA12CA1CA2CA9FFAR1 | |
| Benzoic Acid SCHEMBL16418108 | 0.83 | TSHR (0.64) | KMOCYP2C9HSD17B10DAOTSHR | |
| SCHEMBL4973133 | 0.83 | CA12 (0.56) | CA12CA1CA2CA9CA6 | |
| SCHEMBL1636076 | 0.82 | ALDH1A1 (0.46) | CA12CA1CA2CA9TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 340 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119318887-A | Graphite alkyne multilayer composite membrane and preparation method thereof | 北京化工大学 | 2025-01-17 | — | — | CN | claimed |
| CN-115869785-B | Ultrafast preparation method of graphite alkyne composite membrane | 北京化工大学 | 2024-11-26 | — | — | CN | claimed |
| CN-112543781-B | Polybenzimidazole oligomers having reactive end groups | PBI性能产品公司 | 2024-02-20 | — | — | CN | claimed |
| CN-115869785-A | Ultrafast preparation method of graphite alkyne composite membrane | 北京化工大学 | 2023-03-31 | — | — | CN | claimed |
| CN-109796769-B | Medical nursing gloves | 李新虹 | 2021-06-25 | — | — | CN | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-4722208-A1 | NOVEL BENZAMIDE DERIVATIVE COMPOUND AND PHARMACEUTICAL COMPOSITION COMPRISING SAME | Samjin Pharmaceutical Co., Ltd. (KR) | 2026-04-08 | — | — | EP | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20260056462-A1 | POSITIVE-TONE ORGANOMETALLIC EUV RESISTS | UNIV NEW YORK STATE RES FOUND (US) | 2026-02-26 | — | — | US | disclosed |
| EP-3891149-B1 | RET INHIBITORS, PHARMACEUTICAL COMPOSITIONS AND USES THEREOF | SUNSHINE LAKE PHARMA CO LTD (CN) | 2026-01-28 | — | — | EP | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-1496395-A2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-01-12 | — | — | EP | disclosed |
| EP-1475665-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040197703-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-10-07 | — | — | US | disclosed |
| US-20040053156-A1 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-03-18 | — | — | US | disclosed |
| EP-1388758-A1 | Photosensitive heat resistant resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2004-02-11 | — | — | EP | disclosed |
| US-20030187020-A1 | Chemical compounds | AVENTISUB LLC | 2003-10-02 | — | — | US | disclosed |
| EP-1296972-A1 | ARYLMETHYLAMINE DERIVATIVES FOR USE AS TRYPTASE INHIBITORS | Aventis Pharmaceuticals Inc. (US) | 2003-04-02 | — | — | EP | disclosed |
| WO-2001090101-A1 | ARYLMETHYLAMINE DERIVATIVES FOR USE AS TRYPTASE INHIBITORS | AVENTIS PHARMACEUTICALS INC. (US) | 2001-11-29 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | CA12 3244/4885CA1 2608/4885CA2 3174/4885 |
| US-20030187020-A1 | Chemical compounds | CMA1, TPSB2, TPSG1 | CA12 1714/4885CA1 1776/4885CA2 516/4885 |
| US-20260056462-A1 | POSITIVE-TONE ORGANOMETALLIC EUV RESISTS | H1-2, H1-0, H1-4 | CA12 311/4885CA1 1963/4885CA2 395/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | CA12 2017/4885CA1 1162/4885CA2 1038/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.