Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.42 |
| ▸ | STS | P08842 | 1/20 | 0.41 |
| ▸ | ENPP3 | O14638 | 6/20 | 0.41 |
| ▸ | ENPP1 | P22413 | 5/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.40 |
| ▸ | PGR | P06401 | 1/20 | 0.40 |
| ▸ | AR | P10275 | 1/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 3/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | KIF11 | P52732 | 1/20 | 0.37 |
| ▸ | ENPP2 | Q13822 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methane SCHEMBL3963790 | 0.99 | TDP1 (0.41) | TDP1STSENPP3ENPP1L3MBTL1 | |
| Diphenylsulfane SCHEMBL2898246 | 0.87 | ENPP3 (0.50) | TDP1STSENPP3ENPP1L3MBTL1 | |
| SCHEMBL28114360 | 0.87 | MAPT (0.47) | TDP1ENPP3ENPP1L3MBTL1MAPT | |
| SCHEMBL2437790 | 0.81 | NR3C1 (0.42) | TDP1ENPP3ENPP1L3MBTL1MAPT | |
| Diphenylsulfane SCHEMBL2903351 | 0.80 | TDP1 (0.62) | TDP1STSENPP3ENPP1L3MBTL1 | |
| Diphenylsulfane SCHEMBL4864595 | 0.80 | MEN1 (0.50) | TDP1ENPP3ENPP1MAPTCA2 | |
| Diphenylsulfane SCHEMBL2898459 | 0.80 | ENPP3 (0.49) | TDP1ENPP3ENPP1MAPTAR | |
| Methane SCHEMBL2440088 | 0.80 | NR3C1 (0.41) | TDP1ENPP3ENPP1L3MBTL1MAPT | |
| SCHEMBL9309266 | 0.78 | TDP1 (0.65) | TDP1STSENPP3ENPP1L3MBTL1 | |
| SCHEMBL3652180 | 0.78 | NR3C1 (0.41) | TDP1ENPP3ENPP1L3MBTL1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1963919-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-09-03 | — | — | EP | claimed |
| WO-2007057773-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-24 | — | — | WO | claimed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| CN-103869623-B | Coating composition | 默克专利有限公司 | 2017-07-21 | — | — | CN | disclosed |
| CN-103869623-A | Coating composition | AZ ELECTRONIC MATERIALS USA | 2014-06-18 | — | — | CN | disclosed |
| CN-102209937-B | Coating composition | AZ ELECTRONIC MATERIALS USA | 2014-06-11 | — | — | CN | disclosed |
| CN-101815733-B | Polymers for use in photoresist compositions | AZ ELECTRONIC MATERIALS USA | 2013-06-19 | — | — | CN | disclosed |
| EP-2384457-A2 | COATING COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2011-11-09 | — | — | EP | disclosed |
| CN-102209937-A | Coating composition | AZ ELECTRONIC MATERIALS USA | 2011-10-05 | — | — | CN | disclosed |
| WO-2010055406-A2 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-05-20 | — | — | WO | disclosed |
| EP-1963919-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-09-03 | — | — | EP | disclosed |
| WO-2007057773-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-24 | — | — | WO | disclosed |
| US-20070111138-A1 | Photoactive compounds | MERCK PATENT GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |