Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25468250 | 0.75 | ALDH1A1 (0.43) | MAPTPOLBAPEX1KMT2AATM | |
| SCHEMBL25468115 | 0.74 | KDM4E (0.30) | — | |
| SCHEMBL24909141 | 0.73 | ELANE (0.36) | POLBAPEX1KMT2AATM | |
| SCHEMBL25469952 | 0.72 | — | — | |
| SCHEMBL25519396 | 0.71 | KMT2A (0.43) | MAPTPOLBAPEX1KMT2AATM | |
| SCHEMBL25519414 | 0.68 | GABRA1 (0.38) | MAPTPOLBAPEX1KMT2AATM | |
| SCHEMBL2336086 | 0.68 | TTR (0.46) | KMT2A | |
| SCHEMBL15548526 | 0.68 | KMT2A (0.49) | MAPTPOLBAPEX1KMT2AATM | |
| SCHEMBL26194898 | 0.67 | ELANE (0.44) | MAPTPOLBAPEX1KMT2AATM | |
| SCHEMBL8812365 | 0.67 | SMN1; SMN2 (0.38) | MAPTPOLBKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20230185192-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |