SCHEMBL25812571

SCHEMBL25812571

CCCOCC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
ALDH1A1 P00352 3/20 0.44
GBA2 Q9HCG7 10/20 0.44
LMNA P02545 1/20 0.44
EPHX2 P34913 1/20 0.42
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
GBA1 P04062 4/20 0.41
MAPT P10636 1/20 0.40
ATM Q13315 1/20 0.40
GRIN2D O15399 1/20 0.39
GRIN3B O60391 1/20 0.39
GRIN1 Q05586 1/20 0.39
GRIN2A Q12879 1/20 0.39
GRIN2B Q13224 1/20 0.39
GRIN2C Q14957 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21998610 0.88 GBA2 (0.39) MEN1KMT2AL3MBTL1ALDH1A1GBA2
SCHEMBL13668744 0.86 GBA2 (0.51) GBA2EPHX2GBA1UGCGMGAM
SCHEMBL13672852 0.83 GBA2 (0.52) GBA2EPHX2GBA1UGCGMGAM
SCHEMBL92293 0.82 ALDH1A1 (0.47) MEN1KMT2AL3MBTL1ALDH1A1GBA2
SCHEMBL5095244 0.81 GRIN2D (0.50) MEN1KMT2AL3MBTL1ALDH1A1GBA2
SCHEMBL16682527 0.79 LMNA (0.56) MEN1KMT2AL3MBTL1ALDH1A1LMNA
SCHEMBL29226115 0.78 GBA2 (0.44) ALDH1A1GBA2CA12CA1CA2
SCHEMBL12511153 0.78 GBA2 (0.44) GBA2CA12CA1CA2CA9
SCHEMBL855034 0.75 CA12 (0.45) MEN1KMT2AL3MBTL1ALDH1A1GBA2
SCHEMBL3913351 0.75 CA12 (0.45) MEN1KMT2AL3MBTL1ALDH1A1GBA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375928-A1 Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-23 US disclosed
US-11747726-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-05 US disclosed
US-11703756-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-07-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230375928-A1 Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Generator, Base Rein, Resist Composition, And Patterning Process NAF1, RALA, RSU1 MEN1 3472/4885KMT2A 3299/4885L3MBTL1 2407/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.