SCHEMBL2581746

SCHEMBL2581746

C=C(C)C(=O)OC[SiH](OCC)OCC

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.50
TSHR P16473 4/20 0.44
ALDH1A1 P00352 6/20 0.39
LMNA P02545 1/20 0.34
HSD17B10 Q99714 1/20 0.34
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
HTT P42858 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
MGAM O43451 1/20 0.33
GAA P10253 1/20 0.33
SI P14410 1/20 0.33
MGAM2 Q2M2H8 1/20 0.33
GLO1 Q04760 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8955366 0.91 THRB (0.46) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL29005377 0.82 THRB (0.36) THRBTSHR
SCHEMBL143882 0.81 THRB (0.56) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL28449751 0.81 THRB (0.47) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL1071909 0.79 TSHR (0.47) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL467594 0.79 ALDH1A1 (0.52) TSHRALDH1A1LMNAHSD17B10MGAM
SCHEMBL139125 0.78 TSHR (0.56) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL30558754 0.78 TSHR (0.56) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL2584392 0.78 TSHR (0.45) THRBTSHRALDH1A1LMNAHSD17B10
SCHEMBL98029 0.77 TSHR (0.59) THRBTSHRALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024168360-A2 ENHANCED EMISSIVITY OF POLYMER COMPOSITIONS FOR RADIATIVE COOLING APPLICATIONS FUTUREWEI TECHNOLOGIES, INC. (US) 2024-08-15 WO claimed
CN-113831794-A Basalt flake acrylic resin composite modified polyvinylidene fluoride coating 华麟海(海南)新材料科技有限公司 2021-12-24 CN claimed
CN-111057422-A Polyvinylidene fluoride coating and preparation method thereof 中昊北方涂料工业研究设计院有限公司 2020-04-24 CN claimed
EP-4615884-A1 PROCESS FOR FORMING AN AQUEOUS DISPERSION OF COPOLYMERS, AN ADHESIVE COMPOSITION INCLUDING SUCH COPOLYMERS, A FILM OR AN ARTICLE COMPRISING THE SAME, AND A METHOD OF COATING A SUBSTRATE Wacker Chemie AG (DE) 2025-09-17 EP disclosed
CN-119546705-A Curable polysiloxane composition and sealant comprising the same 瓦克化学股份公司 2025-02-28 CN disclosed
CN-118974157-A Crosslinkable compositions based on organosilicon compounds 瓦克化学股份公司 2024-11-15 CN disclosed
CN-118891303-A A composition 瓦克化学股份公司 2024-11-01 CN disclosed
CN-118891335-A A composition 瓦克化学股份公司 2024-11-01 CN disclosed
WO-2024168360-A2 ENHANCED EMISSIVITY OF POLYMER COMPOSITIONS FOR RADIATIVE COOLING APPLICATIONS FUTUREWEI TECHNOLOGIES, INC. (US) 2024-08-15 WO disclosed
WO-2024100162-A1 PROCESS FOR FORMING AN AQUEOUS DISPERSION OF COPOLYMERS, AN ADHESIVE COMPOSITION INCLUDING SUCH COPOLYMERS, A FILM OR AN ARTICLE COMPRISING THE SAME, AND A METHOD OF COATING A SUBSTRATE WACKER CHEMIE AG (DE) 2024-05-16 WO disclosed
CN-117795011-A A composition 瓦克化学股份公司 2024-03-29 CN disclosed
US-20090162782-A1 Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-06-25 US disclosed
CN-100478363-C Curable composition containing surface-modified particles CONSORTIUM ELEKTROCHEM IND (DE) 2009-04-15 CN disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
CN-101374888-A Polymer mixtures containing alkoxysilane terminated polymers WACKER CHEMIE AG (DE) 2009-02-25 CN disclosed
EP-1972998-A1 SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM Nissan Chemical Industries, Ltd. (JP) 2008-09-24 EP disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed
CN-1934138-A Curable composition containing surface-modified particles CONSORTIUM ELEKTROCHEM IND (DE) 2007-03-21 CN disclosed
US-6399212-B1 COATINGS WITH ORGANOSILICON COMPOUNDS AND SOLUTION OF SILICOFLUORIC ACID AND SILICON DIOXIDE NIPPON SHEET GLASS CO., LTD. (JP) 2002-06-04 US disclosed
EP-1094090-A2 Silicon dioxide-coated polyolefin resin and process for its production NIPPON SHEET GLASS CO. LTD. (JP) 2001-04-25 EP disclosed