SCHEMBL2584600

SCHEMBL2584600

C=CC(=O)OC[SiH](OC)OC

nearest known ligand 0.47

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.47
HPGD P15428 1/20 0.45
ALDH1A1 P00352 7/20 0.45
TP53 P04637 3/20 0.45
HIF1A Q16665 3/20 0.45
CYP3A4 P08684 2/20 0.45
HSD17B10 Q99714 1/20 0.45
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
THRB P10828 3/20 0.38
HCAR2 Q8TDS4 2/20 0.33
KEAP1 Q14145 1/20 0.33
NFE2L2 Q16236 1/20 0.33
LMNA P02545 1/20 0.31
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28470608 0.83 TSHR (0.62) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL28624266 0.81 TSHR (0.45) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL2579458 0.79 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL108693 0.79 TSHR (0.52) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL107385 0.79 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL552010 0.78 GSTP1 (0.37) ALDH1A1HCAR2KEAP1NFE2L2LMNA
SCHEMBL1682125 0.77
SCHEMBL108962 0.76 TSHR (0.53) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL5406660 0.76 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL139742 0.76 TSHR (0.59) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119569771-A Photochromic agent, photochromic anti-counterfeiting silicone adhesive, and preparation methods and applications thereof 广州集泰化工股份有限公司 2025-03-07 CN claimed
CN-114829430-B Curable composition comprising a multistage polymer 阿科玛法国公司 2025-04-22 CN disclosed
EP-4098713-B1 ADHESIVE COMPOSITION AND BONDED STRUCTURE SUNSTAR ENGINEERING INC (JP) 2025-03-12 EP disclosed
CN-119584936-A Curable composition for producing transparent orthodontic accessories 舒万诺知识产权公司 2025-03-07 CN disclosed
CN-119546705-A Curable polysiloxane composition and sealant comprising the same 瓦克化学股份公司 2025-02-28 CN disclosed
CN-119264813-A Photo-curing high-temperature-resistant optical fiber coating and preparation method thereof 普利技术潜江有限公司 2025-01-07 CN disclosed
CN-118891335-A A composition 瓦克化学股份公司 2024-11-01 CN disclosed
CN-118891303-A A composition 瓦克化学股份公司 2024-11-01 CN disclosed
US-20240183812-A1 POROUS MOISTURE-SENSITIVE MEMBER, HUMIDITY SENSOR, AND RESPIRATION SENSING SYSTEM MURATA MANUFACTURING CO., LTD. (JP) 2024-06-06 US disclosed
CN-117940766-A Porous humidity sensing member, humidity sensor, and respiration detection system 株式会社村田制作所 2024-04-26 CN disclosed
CN-102083875-A Grafted polyethylene DOW CORNING 2011-06-01 CN disclosed
CN-102076725-A Modified polyolefins DOW CORNING 2011-05-25 CN disclosed
US-20090162782-A1 Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-06-25 US disclosed
CN-100478363-C Curable composition containing surface-modified particles CONSORTIUM ELEKTROCHEM IND (DE) 2009-04-15 CN disclosed
EP-1972998-A1 SILICON-CONTAINING RESIST UNDERLYING LAYER FILM FORMING COMPOSITION FOR FORMATION OF PHOTOCROSSLINKING CURED RESIST UNDERLYING LAYER FILM Nissan Chemical Industries, Ltd. (JP) 2008-09-24 EP disclosed
WO-2008090458-A1 AQUEOUS SILYLATED POLYMER EMULSION AND ITS PREPARATION METHOD AND USES THEREOF HENKEL KGAA (DE) 2008-07-31 WO disclosed
CN-100369995-C Curing composition for organosilicon compound and silicone-based coating agent composition SHINETSU CHEMICAL CO (JP) 2008-02-20 CN disclosed
CN-1934138-A Curable composition containing surface-modified particles CONSORTIUM ELEKTROCHEM IND (DE) 2007-03-21 CN disclosed
CN-1637098-A Curing composition for organosilicon compound and silicone-based coating agent composition SHINETSU CHEMICAL CO (JP) 2005-07-13 CN disclosed
US-20050143491-A1 Ink composition for ink jet recording, manufacturing method of the same, and ink jet recording method FUJI PHOTO FILM., LTD. 2005-06-30 US disclosed