SCHEMBL108693

SCHEMBL108693

C=CC(=O)OCC[SiH](OC)OC

nearest known ligand 0.52

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.52
ALDH1A1 P00352 4/20 0.52
TP53 P04637 3/20 0.52
HIF1A Q16665 3/20 0.52
CYP3A4 P08684 2/20 0.52
HSD17B10 Q99714 1/20 0.52
HPGD P15428 1/20 0.52
THRB P10828 2/20 0.43
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
ATM Q13315 1/20 0.32
HCAR2 Q8TDS4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL139742 0.89 TSHR (0.59) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL28074744 0.87 TSHR (0.57) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL80819 0.87 TSHR (0.62) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL23174784 0.85 TSHR (0.66) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL6151225 0.85 TSHR (0.66) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL16286524 0.85 TSHR (0.66) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL28152256 0.83 TSHR (0.51) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL5395147 0.81 TSHR (0.48) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL238023 0.81 TSHR (0.53) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL238723 0.79 TSHR (0.56) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 318 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3268411-A1 A POLYORGANOSILOXANE AND A MOISTURE AND RADIATION CURABLE ADHESIVE COMPOSITION COMPRISING THE SAME Henkel IP & Holding GmbH (DE) 2018-01-17 EP claimed
WO-2016141547-A1 A POLYORGANOSILOXANE AND A MOISTURE AND RADIATION CURABLE ADHESIVE COMPOSITION COMPRISING THE SAME Henkel IP Holding GmbH (DE) 2016-09-15 WO claimed
US-8865837-B2 Organosilicon compounds, production processes thereof, pressure-sensitive adhesive compositions containing the organosilicon compounds, self-adhesive polarizers and liquid crystal displays SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-21 US claimed
US-8431649-B2 Organosilicon compounds, production processes thereof, pressure-sensitive adhesive compositions containing the organosilicon compounds, self-adhesive polarizers and liquid crystal displays SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-30 US claimed
US-20130066014-A1 ORGANOSILICON COMPOUNDS, PRODUCTION PROCESSES THEREOF, PRESSURE-SENSITIVE ADHESIVE COMPOSITIONS CONTAINING THE ORGANOSILICON COMPOUNDS, SELF-ADHESIVE POLARIZERS AND LIQUID CRYSTAL DISPLAYS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-14 US claimed
US-6841694-B2 Process for stabilizing unsaturated organosilicon compounds WACKER-CHEMIE GMBH (DE) 2005-01-11 US claimed
US-20040171859-A1 Process for stabilizing unsaturated organosilicon compounds WACKER-CHEMIE GMBH (DE) 2004-09-02 US claimed
EP-4727982-A1 PRIMER COMPOSITION, ADHESIVE SYSTEM, AND RELATED PROCESSES 3M Innovative Properties Company (US) 2026-04-22 EP disclosed
EP-3585851-B1 AIR AND WATER BARRIER ARTICLE INCLUDING INELASTIC POROUS LAYER 3M INNOVATIVE PROPERTIES COMPANY (US) 2026-04-01 EP disclosed
US-12448479-B2 Radiation curable and printable composition HENKEL AG & CO. KGAA (DE) 2025-10-21 US disclosed
US-12403671-B2 Roll including air and water barrier article and method of using the same 3M INNOVATIVE PROPERTIES COMPANY (US) 2025-09-02 US disclosed
US-20250215158-A1 Cross-linkable compositions on the basis of organosilicon compounds WACKER CHEMIE AG (DE) 2025-07-03 US disclosed
US-20250197672-A1 A COMPOSITION WACKER CHEMIE AG (DE) 2025-06-19 US disclosed
US-6028127-A Artificial marble and method for preparing it MITSUBISHI RAYON CO., LTD. (JP) 2000-02-22 US disclosed
EP-0486279-B2 Process for removing acidic impurities from alkoxysilanes SHINETSU CHEMICAL CO (JP) 1999-12-01 EP disclosed
EP-0934987-A1 Primer composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-08-11 EP disclosed
EP-0786440-A1 ARTIFICIAL MARBLE AND PROCESS FOR PRODUCING THE SAME MITSUBISHI RAYON CO., LTD. (JP) 1997-07-30 EP disclosed
US-5247117-A Neutralization with sterically hindered alcohols or amines, distillation SHIN-ETSU CHEMICAL CO., LTD. (JP) 1993-09-21 US disclosed
EP-0486279-A1 Process for removing acidic impurities from alkoxysilanes SHIN-ETSU CHEMICAL CO., LTD. (JP) 1992-05-20 EP disclosed
US-5025049-A Organic copolymer containing alkoxysilylated monomer, polyalkyl (meth) acrylate, crosslinking agent and ultraviolet absorber SHIN-ETSU CHEMICAL CO., LTD. (JP) 1991-06-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040171859-A1 Process for stabilizing unsaturated organosilicon compounds ELOVL1, ELOVL6, DEGS1 TSHR 4650/4885ALDH1A1 402/4885TP53 4663/4885
US-20130066014-A1 ORGANOSILICON COMPOUNDS, PRODUCTION PROCESSES THEREOF, PRESSURE-SENSITIVE ADHESIVE COMPOSITIONS CONTAINING THE ORGANOSILICON COMPOUNDS, SELF-ADHESIVE POLARIZERS AND LIQUID CRYSTAL DISPLAYS L1CAM, CDH1, CCND1 TSHR 4334/4885ALDH1A1 1658/4885TP53 3163/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.