SCHEMBL25916385

SCHEMBL25916385

C=C(C)C(=O)OC(C)(C)c1cccc(C)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.41
HSD17B10 Q99714 1/20 0.37
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
KIF11 P52732 3/20 0.36
KMT2A Q03164 4/20 0.35
MEN1 O00255 3/20 0.35
HTT P42858 3/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
PARP1 P09874 1/20 0.35
HPGD P15428 1/20 0.35
PTPN5 P54829 1/20 0.34
KCNK3 O14649 1/20 0.34
RAB9A P51151 1/20 0.34
EDNRB P24530 1/20 0.34
EDNRA P25101 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17914407 0.84 ACHE (0.34) LMNACYP2C19KMT2AHTTMAPT
SCHEMBL26059953 0.84 CYP3A4 (0.44) LMNAHSD17B10CYP1A2CYP3A4KIF11
SCHEMBL3126665 0.83 ACHE (0.38) LMNAHSD17B10CYP1A2CYP3A4CYP2D6
SCHEMBL14827330 0.83 CES2 (0.44) LMNAKMT2AMEN1HTTSMN1; SMN2
SCHEMBL9865144 0.83 L3MBTL1 (0.47) LMNACYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL27432341 0.83 TP53BP1 (0.33) LMNACYP2C19KMT2AHTTMAPT
SCHEMBL14827347 0.83 KCNN4 (0.45) HTTPARP1RAB9AEDNRBEDNRA
SCHEMBL17914414 0.83 ALDH1A1 (0.41) LMNACYP1A2CYP3A4CYP2D6CYP2C9
SCHEMBL26059944 0.82 ELANE (0.43) LMNACYP3A4KMT2AMEN1
SCHEMBL3393201 0.82 ALDH1A1 (0.48) CYP1A2CYP3A4CYP2D6CYP2C19KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375925-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN FUJIFILM CORPORATION (JP) 2023-11-23 US disclosed
US-20230367210-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-16 US disclosed
US-20230221640-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-07-13 US disclosed