SCHEMBL25969112

SCHEMBL25969112

CC(=O)N(C(C)=O)c1cc(O)cc2ccccc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.52
NQO2 P16083 1/20 0.48
CDC25B P30305 3/20 0.44
ALDH1A1 P00352 3/20 0.43
HPGD P15428 3/20 0.43
MAPT P10636 3/20 0.43
KDM4E B2RXH2 3/20 0.43
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
MPI P34949 1/20 0.43
CYP1A2 P05177 2/20 0.39
GLA P06280 1/20 0.39
CYP2C19 P33261 1/20 0.39
HSD17B10 Q99714 1/20 0.39
BAZ2B Q9UIF8 1/20 0.37
TRPM4 Q8TD43 1/20 0.37
SIGMAR1 Q99720 1/20 0.36
LDHA P00338 1/20 0.36
PTPN1 P18031 1/20 0.35
CA5A P35218 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969102 0.81 GAA (0.59) GAAALDH1A1HPGDMAPTCYP1A2
SCHEMBL14975317 0.78 NQO2 (0.55) GAANQO2CDC25BALDH1A1HPGD
SCHEMBL11024265 0.78 GAA (0.77) GAAALDH1A1HPGDMAPTKDM4E
SCHEMBL21990258 0.75 NQO2 (0.52) NQO2CDC25BALDH1A1HPGDMAPT
SCHEMBL1408788 0.74 NQO2 (0.50) GAANQO2CDC25BALDH1A1HPGD
SCHEMBL25969099 0.74 GAA (0.53) GAAALDH1A1HPGDMAPTMEN1
SCHEMBL10909445 0.73 CDC25B (0.60) NQO2CDC25BALDH1A1HPGDMAPT
SCHEMBL25969101 0.73 GAA (0.47) GAAALDH1A1HPGDMAPTKDM4E
SCHEMBL25969106 0.71 MCL1 (0.65) GAAMAPTKDM4EMEN1KMT2A
SCHEMBL21513960 0.70 GAA (0.70) GAAALDH1A1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed