SCHEMBL25969111

SCHEMBL25969111

CC(=O)N(C(C)=O)c1ccc2cc(O)ccc2c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.43
HSD17B10 Q99714 3/20 0.42
POLB P06746 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
ESR1 P03372 5/20 0.41
ESR2 Q92731 5/20 0.41
CYP3A4 P08684 1/20 0.41
ALOX15 P16050 1/20 0.41
TSHR P16473 1/20 0.41
HIF1A Q16665 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CLK1 P49759 2/20 0.41
DYRK1A Q13627 2/20 0.41
DYRK1B Q9Y463 2/20 0.41
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
KDM4E B2RXH2 1/20 0.40
ALDH1A1 P00352 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969113 0.94 ESR1 (0.42) CYP1A2HSD17B10POLBNPSR1ESR1
SCHEMBL27277472 0.82 CRHBP (0.47) CYP1A2HSD17B10POLBNPSR1ESR1
SCHEMBL9704866 0.81 ESR1 (0.49) CYP1A2HSD17B10ESR1ESR2CYP3A4
SCHEMBL10292556 0.79 ALDH1A1 (0.45) HSD17B10POLBNPSR1ESR1ESR2
SCHEMBL8374423 0.76 ALDH1A1 (0.57) CYP1A2HSD17B10CYP3A4TSHRKDM4E
SCHEMBL28269013 0.75 TSHR (0.56) CYP1A2HSD17B10ESR1ESR2CYP3A4
SCHEMBL1680160 0.74 CYP1A2 (0.54) CYP1A2HSD17B10ESR1ESR2CYP3A4
SCHEMBL5398870 0.74 CRHBP (0.47) CYP1A2HSD17B10POLBNPSR1ESR1
SCHEMBL11800568 0.74 KDM4E (0.52) HSD17B10POLBNPSR1ALOX15TSHR
SCHEMBL803612 0.73 GAA (0.48) HSD17B10POLBNPSR1ALOX15TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3869268-B1 MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER SHINETSU CHEMICAL CO (JP) 2024-01-17 EP disclosed
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed