SCHEMBL25969113

SCHEMBL25969113

CC(=O)N(C(C)=O)c1ccc2ccc(O)cc2c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 6/20 0.42
ESR2 Q92731 4/20 0.42
CYP1A2 P05177 1/20 0.42
HSD17B10 Q99714 2/20 0.41
POLB P06746 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
CLK1 P49759 2/20 0.39
DYRK1A Q13627 2/20 0.39
DYRK1B Q9Y463 2/20 0.39
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
GLA P06280 1/20 0.39
GAA P10253 1/20 0.39
HPGD P15428 1/20 0.39
CASP1 P29466 1/20 0.39
BRCA1 P38398 1/20 0.39
CASP7 P55210 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CRHBP P24387 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969111 0.94 CYP1A2 (0.43) ESR1ESR2CYP1A2HSD17B10POLB
SCHEMBL27277472 0.81 CRHBP (0.47) ESR1ESR2CYP1A2HSD17B10POLB
SCHEMBL10292556 0.78 ALDH1A1 (0.45) ESR1ESR2HSD17B10POLBNPSR1
SCHEMBL9704866 0.76 ESR1 (0.49) ESR1ESR2CYP1A2HSD17B10CLK1
SCHEMBL15390662 0.76 ALDH1A1 (0.54) ESR1ESR2CYP1A2HSD17B10ALDH1A1
SCHEMBL8374423 0.75 ALDH1A1 (0.57) CYP1A2HSD17B10KDM4EALDH1A1LMNA
SCHEMBL5398870 0.73 CRHBP (0.47) ESR1ESR2CYP1A2HSD17B10POLB
SCHEMBL11800568 0.72 KDM4E (0.52) HSD17B10POLBNPSR1KDM4EALDH1A1
SCHEMBL803612 0.72 GAA (0.48) HSD17B10POLBNPSR1KDM4EALDH1A1
SCHEMBL29358095 0.72 CYP1A2 (0.72) ESR1ESR2CYP1A2HSD17B10NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed