SCHEMBL25969102

SCHEMBL25969102

CC(=O)N(C(C)=O)c1cccc2cc(O)ccc12

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.59
MCL1 Q07820 1/20 0.47
PTPN1 P18031 3/20 0.43
TLR8 Q9NR97 1/20 0.41
CLK1 P49759 2/20 0.40
DYRK1A Q13627 2/20 0.40
DYRK1B Q9Y463 2/20 0.40
THRA P10827 1/20 0.39
THRB P10828 1/20 0.39
MTNR1A P48039 1/20 0.38
MTNR1B P49286 1/20 0.38
CYP1A2 P05177 1/20 0.38
ESR1 P03372 4/20 0.38
ESR2 Q92731 4/20 0.38
HSD17B1 P14061 1/20 0.38
HSD17B2 P37059 1/20 0.38
KCNJ11 Q14654 1/20 0.38
IDH1 O75874 1/20 0.37
ALDH1A1 P00352 1/20 0.37
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25969106 0.87 MCL1 (0.65) GAAMCL1PTPN1MTNR1AMTNR1B
SCHEMBL25969112 0.81 GAA (0.52) GAAMCL1PTPN1CYP1A2ALDH1A1
SCHEMBL11024265 0.80 GAA (0.77) GAAMTNR1AMTNR1BCYP1A2ALDH1A1
SCHEMBL9816154 0.79 MCL1 (0.73) GAAMCL1PTPN1TLR8DYRK1A
SCHEMBL117125 0.75 MCL1 (0.43) MCL1PTPN1TLR8CLK1DYRK1A
SCHEMBL11817172 0.75 ALDH1A1 (0.49) MCL1TLR8THRATHRBCYP1A2
SCHEMBL23581544 0.74 TLR8 (0.47) GAAPTPN1TLR8CLK1DYRK1A
Acetic Acid SCHEMBL28169164 0.74 HSD17B1 (0.58) TLR8CLK1DYRK1ADYRK1BTHRA
SCHEMBL25969084 0.72 GAA (0.47) GAACLK1DYRK1ADYRK1BTHRB
SCHEMBL25969103 0.72 GAA (0.81) GAAMCL1THRBCYP1A2ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed