SCHEMBL25969481

SCHEMBL25969481

CCC(C)(c1ccc(Oc2ccccc2)cc1)c1ccc(Oc2ccccc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 9/20 0.53
NPC1 O15118 3/20 0.50
RAB9A P51151 3/20 0.50
MAPT P10636 2/20 0.50
POLB P06746 1/20 0.49
CYP2C9 P11712 1/20 0.49
TSHR P16473 1/20 0.48
NR1H2 P55055 1/20 0.43
BAX Q07812 1/20 0.43
MAOA P21397 1/20 0.43
PPARA Q07869 1/20 0.42
ALDH1A1 P00352 1/20 0.42
HPGD P15428 1/20 0.42
MAPK1 P28482 1/20 0.42
LMNA P02545 1/20 0.42
HTT P42858 1/20 0.42
RIPK1 Q13546 1/20 0.42
PLA2G2A P14555 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20133387 0.84 MAPT (0.50) LTA4HNPC1RAB9AMAPTPOLB
SCHEMBL2607726 0.84 NPC1 (0.70) LTA4HNPC1RAB9AMAPTPOLB
SCHEMBL13930949 0.84 LTA4H (0.53) LTA4HNPC1RAB9AMAPTPOLB
SCHEMBL14159535 0.83 ALDH1A1 (0.56) LTA4HNPC1RAB9AMAPTPOLB
SCHEMBL12805019 0.83 RAB9A (0.52) LTA4HNPC1RAB9AMAPTPOLB
SCHEMBL1857763 0.82 MAPT (0.73) NPC1RAB9AMAPTPOLBTSHR
SCHEMBL12805064 0.82 LTA4H (0.55) LTA4HNPC1RAB9AMAPTTSHR
SCHEMBL29947925 0.81 MAOB (0.56) LTA4HNPC1RAB9AMAPTPOLB
SCHEMBL308673 0.81 MAOB (0.56) LTA4HNPC1RAB9AMAPTPOLB
SCHEMBL16395007 0.80 L3MBTL1 (0.49) NPC1RAB9AMAPTPOLBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed