Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.48 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.48 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12914637 | 0.94 | CYP17A1 (0.44) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL12914640 | 0.86 | CYP17A1 (0.41) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL12914651 | 0.83 | CYP17A1 (0.41) | CYP17A1CYP19A1HSD11B1MEN1KMT2A | |
| SCHEMBL17322536 | 0.81 | CYP19A1 (0.50) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL119734 | 0.81 | CYP19A1 (0.50) | CYP17A1CYP19A1HSD11B1ALDH1A1 | |
| SCHEMBL210246 | 0.81 | CYP19A1 (0.45) | CYP17A1CYP19A1MEN1KMT2AALDH1A1 | |
| SCHEMBL949603 | 0.81 | CYP17A1 (0.45) | CYP17A1CYP19A1 | |
| SCHEMBL12914642 | 0.81 | CYP17A1 (0.45) | CYP17A1CYP19A1HSD11B1MEN1KMT2A | |
| SCHEMBL854489 | 0.81 | CYP17A1 (0.45) | CYP17A1CYP19A1KMT2AALDH1A1 | |
| SCHEMBL2603148 | 0.81 | HSD11B1 (0.33) | CYP17A1CYP19A1HSD11B1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200249573-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-06 | — | — | US | disclosed |
| US-9410016-B2 | Aromatic polyacetals and articles comprising them | DOW GLOBAL TECHNOLOGIES LLC (US) | 2016-08-09 | — | — | US | disclosed |
| US-9290435-B2 | Molecular glass of spirofluorene derivative, preparation method thereof and use thereof in photo-etching | Technical Institute of Physics and Chemistry of the Chinese Academy of Sciences (CN) | 2016-03-22 | — | — | US | disclosed |
| US-20150353468-A1 | MOLECULAR GLASS OF SPIROFLUORENE DERIVATIVE, PREPARATION METHOD THEREOF AND USE THEREOF IN PHOTO-ETCHING | Technical Institute of Physics and Chemistry of the Chinese Academy of Sciences (CN) | 2015-12-10 | — | — | US | disclosed |
| US-20150031847-A1 | METHOD OF FORMING POLYARYL POLYMERS | DOW GLOBAL TECHNOLOGIES LLC | 2015-01-29 | — | — | US | disclosed |
| US-20150025262-A1 | BIS(ARYL)ACETAL COMPOUNDS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-01-22 | — | — | US | disclosed |
| US-20150025278-A1 | AROMATIC POLYACETALS AND ARTICLES COMPRISING THEM | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-01-22 | — | — | US | disclosed |
| US-8933239-B1 | Bis(aryl)acetal compounds | DOW GLOBAL TECHNOLOGIES LLC (US) | 2015-01-13 | — | — | US | disclosed |
| US-8158329-B2 | Compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20110008728-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20110008728-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | IDEMITSU KOSAN CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | IDEMITSU KOSAN CO., LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100190107-A1 | CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION | IDEMITSU KOSAN CO. LTD (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20100190107-A1 | CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION | IDEMITSU KOSAN CO. LTD (JP) | 2010-07-29 | — | — | US | disclosed |
| US-20100151379-A1 | COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-06-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100151379-A1 | COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | C5, C1R, C9 | CYP17A1 689/4885CYP19A1 85/4885HSD11B1 653/4885 |
| US-20100190107-A1 | CYCLIC COMPOUND, PHOTORESIST BASE MATERIAL AND PHOTORESIST COMPOSITION | CRY1, PCNA, ERCC4 | CYP17A1 1599/4885CYP19A1 803/4885HSD11B1 1416/4885 |
| US-20150025262-A1 | BIS(ARYL)ACETAL COMPOUNDS | BOLA2; BOLA2B, TARS1, CBR1 | CYP17A1 522/4885CYP19A1 132/4885HSD11B1 1357/4885 |
| US-20150025278-A1 | AROMATIC POLYACETALS AND ARTICLES COMPRISING THEM | AR, PARP1, PARG | CYP17A1 1735/4885CYP19A1 1240/4885HSD11B1 3768/4885 |
| US-20200249573-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD | PRDM9, FBXL19, PRMT9 | CYP17A1 3426/4885CYP19A1 3982/4885HSD11B1 4686/4885 |
| US-20100266952-A1 | CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE | C1S, CCNL2, CCNT1 | CYP17A1 1685/4885CYP19A1 1050/4885HSD11B1 1239/4885 |
| US-20150353468-A1 | MOLECULAR GLASS OF SPIROFLUORENE DERIVATIVE, PREPARATION METHOD THEREOF AND USE THEREOF IN PHOTO-ETCHING | PDGFRA, ARHGEF12, GLI2 | CYP17A1 1167/4885CYP19A1 1533/4885HSD11B1 1295/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.