⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13999385 | 0.79 | — | — | |
| SCHEMBL21182199 | 0.79 | — | — | |
| SCHEMBL25011561 | 0.77 | SIGMAR1 (0.33) | — | |
| SCHEMBL25502244 | 0.76 | ALDH1A1 (0.35) | — | |
| SCHEMBL21613435 | 0.76 | ALDH1A1 (0.35) | — | |
| SCHEMBL172335 | 0.76 | ALDH1A1 (0.35) | — | |
| SCHEMBL276718 | 0.72 | TSHR (0.33) | — | |
| SCHEMBL28857959 | 0.72 | LMNA (0.37) | — | |
| SCHEMBL19451052 | 0.72 | — | — | |
| SCHEMBL18697946 | 0.71 | ADH1B (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3284771-B1 | HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT | TORAY INDUSTRIES (JP) | 2023-08-30 | — | — | EP | disclosed |