SCHEMBL276718

SCHEMBL276718

CCC(C)C(C)NC(C)C(C)CC

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23222811 0.91
SCHEMBL23822847 0.87 TDP1 (0.41) TSHRALDH1A1
SCHEMBL10237650 0.87 TDP1 (0.41) TSHRALDH1A1
SCHEMBL24912881 0.87 TDP1 (0.41) TSHRALDH1A1
SCHEMBL10284206 0.87 TDP1 (0.41) TSHRALDH1A1
SCHEMBL172335 0.84 ALDH1A1 (0.35) TSHRALDH1A1
SCHEMBL25502244 0.84 ALDH1A1 (0.35) TSHRALDH1A1
SCHEMBL21613435 0.84 ALDH1A1 (0.35) TSHRALDH1A1
SCHEMBL7964904 0.82 ALDH1A1 (0.30) ALDH1A1
SCHEMBL23949972 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117616032-A Rare earth complex 东曹株式会社 2024-02-27 CN disclosed
US-11548984-B2 Light- or heat-curing method and curable resin composition FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2023-01-10 US disclosed
US-10774062-B2 Photocuring method, compound and composition used therein FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2020-09-15 US disclosed
EP-3409709-B1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
EP-3327002-B1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-20200123324-A1 LIGHT- OR HEAT-CURING METHOD AND CURABLE RESIN COMPOSITION FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2020-04-23 US disclosed
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-20190055210-A1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-02-21 US disclosed
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-01-03 US disclosed
EP-3409709-A1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN FUJIFILM Wako Pure Chemical Corporation (JP) 2018-12-05 EP disclosed
US-5773172-A SOLVENT AND BINDER SOLUBILITY MITSUI TOATSU CHEMICALS, INC. (JP) 1998-06-30 US disclosed
EP-0564237-B1 Preparation of color filter and photo-setting resin therefor MITSUI TOATSU CHEMICALS (JP) 1998-03-11 EP disclosed
EP-0818512-A1 Quinoline derivative and use of same MITSUI TOATSU CHEMICALS, Inc. (JP) 1998-01-14 EP disclosed
US-5695911-A CONTAINING PHTHALOCYANINE COMPOUND MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1997-12-09 US disclosed
US-5482804-A Resin composition for color filter MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1996-01-09 US disclosed
EP-0633296-A1 Novel dyestuffs and their use MITSUI TOATSU CHEMICALS, Inc. (JP) 1995-01-11 EP disclosed
US-5380842-A Color filters MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1995-01-10 US disclosed
EP-0564237-A2 Preparation of color filter and photo-setting resin therefor MITSUI TOATSU CHEMICALS, Inc. (JP) 1993-10-06 EP disclosed
EP-0562832-A1 Indole and indazole derivatives, for the treatment and prophylaxis of cerebral disorders, their preparation and their use SANKYO COMPANY LIMITED (JP) 1993-09-29 EP disclosed
EP-0519423-A2 Phthalocyanine compounds and usage thereof MITSUI TOATSU CHEMICALS, Inc. (JP) 1992-12-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator REV1, RER1, CBR1 TSHR 1154/4885ALDH1A1 847/4885
US-20190055210-A1 PHOTOCURING METHOD, COMPOUND AND COMPOSITION USED THEREIN ESD, TMT1A, PAM TSHR 4741/4885ALDH1A1 23/4885
US-10774062-B2 Photocuring method, compound and composition used therein ESD, TMT1A, PAM TSHR 4741/4885ALDH1A1 23/4885
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR REV1, RER1, CBR1 TSHR 1154/4885ALDH1A1 847/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.