Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAP4K4 | O95819 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | CASP3 | P42574 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.32 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.32 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.32 |
| ▸ | NT5E | P21589 | 1/20 | 0.31 |
| ▸ | ALKBH3 | Q96Q83 | 1/20 | 0.31 |
| ▸ | ABL1 | P00519 | 2/20 | 0.30 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.30 |
| ▸ | BCR | P11274 | 2/20 | 0.30 |
| ▸ | ERN1 | O75460 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23432887 | 0.80 | PRKAB2 (0.34) | MAP4K4NPC1TP53MAPK1CASP3 | |
| SCHEMBL23598316 | 0.76 | ACHE (0.44) | NPC1RAB9A | |
| SCHEMBL21189178 | 0.68 | MAPK1 (0.32) | MAPK1 | |
| SCHEMBL20048179 | 0.68 | PPARG (0.41) | NPC1TP53MAPK1RAB9ASMN1; SMN2 | |
| SCHEMBL23443671 | 0.67 | ALDH1A3 (0.56) | SMN1; SMN2 | |
| SCHEMBL6697875 | 0.67 | ALDH1A1 (0.39) | — | |
| SCHEMBL19646186 | 0.66 | AOC3 (0.32) | — | |
| SCHEMBL6697835 | 0.66 | MAPT (0.36) | — | |
| SCHEMBL21235238 | 0.66 | SLC6A4 (0.41) | — | |
| SCHEMBL19428100 | 0.66 | PPARG (0.41) | RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023162837-A1 | POSITIVE ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND COMPOUND | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162838-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |