SCHEMBL26163201

SCHEMBL26163201

CC(=O)/C=C(\O)c1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.50
CA1 P00915 3/20 0.50
CA2 P00918 3/20 0.50
CA9 Q16790 3/20 0.50
CA7 P43166 2/20 0.50
CA14 Q9ULX7 2/20 0.50
CA3 P07451 1/20 0.50
TYR P14679 1/20 0.50
DRD1 P21728 1/20 0.50
CA4 P22748 1/20 0.50
CA6 P23280 1/20 0.50
CA5A P35218 1/20 0.50
CA5B Q9Y2D0 1/20 0.50
HSD17B1 P14061 1/20 0.48
CPT1B Q92523 1/20 0.46
MAPT P10636 5/20 0.46
ESR1 P03372 3/20 0.46
LMNA P02545 2/20 0.46
ESR2 Q92731 2/20 0.46
PKM P14618 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26147588 0.83 ALDH1A1 (0.59) MAPTLMNAPKMHPGDHTT
SCHEMBL10304521 0.82 NFE2L2 (0.64) CA12CA1CA2CA9CA7
SCHEMBL11498687 0.82 NFE2L2 (0.64) CA12CA1CA2CA9CA7
SCHEMBL668443 0.82 NFE2L2 (0.64) CA12CA1CA2CA9CA7
SCHEMBL7598129 0.82 CA2 (0.54) CA12CA1CA2CA9CA7
SCHEMBL12168638 0.81 MAPT (0.48) CA12CA1CA2CA9MAPT
SCHEMBL26163200 0.81 ALOX15 (0.52) CA1CA2MAPTHPGDHTT
SCHEMBL14185118 0.81 CYP1A2 (0.66) CA12CA1CA2CA9MAPT
SCHEMBL15454975 0.80 NFE2L2 (0.61) CA12CA1CA2CA9CA7
SCHEMBL15454973 0.80 NFE2L2 (0.61) CA12CA1CA2CA9CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed