SCHEMBL2616655

SCHEMBL2616655

CO[Si](CCCSCCC(=O)OCCC(=O)O)(OC)OC

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
PLA2G4B P0C869 4/20 0.39
LMNA P02545 1/20 0.37
KMT2A Q03164 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
TSHR P16473 2/20 0.35
BHMT Q93088 2/20 0.33
ALDH1A1 P00352 1/20 0.32
DGKA P23743 1/20 0.31
PTGS1 P23219 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2616695 0.93 PLA2G4B (0.38) PLA2G4BLMNAKMT2AHSD17B10TDP1
SCHEMBL10178872 0.91 DGKA (0.38) PLA2G4BHSD17B10TSHRDGKA
SCHEMBL2616693 0.87 MGLL (0.35) PLA2G4BDGKA
SCHEMBL16158630 0.86 HSD17B10 (0.52) PLA2G4BLMNAKMT2AHSD17B10TDP1
SCHEMBL13260890 0.84 ADRA2A (0.50) LMNATSHR
SCHEMBL16728123 0.83 DNM1 (0.47) KMT2AHSD17B10ALDH1A1
SCHEMBL13789646 0.82 ENPP2 (0.34) DGKA
SCHEMBL10178848 0.81 TSHR (0.43) LMNAKMT2AHSD17B10TDP1TSHR
SCHEMBL2616669 0.80 PLA2G4B (0.44) PLA2G4BLMNAKMT2AHSD17B10TDP1
SCHEMBL16728063 0.79 DNM1 (0.43) PLA2G4BALDH1A1DGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8492071-B2 Curable composition, color filter and process for production thereof, and solid-state imaging device FUJIFILM CORPORATION (JP) 2013-07-23 US disclosed
US-8182968-B2 Color filter and method for producing the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-8158307-B2 Forming first color pattern in repeating pattern on substrate; forming second color pattern on substrate; removal by dry etching; forming third color pattern FUJIFILM CORPORATION (JP) 2012-04-17 US disclosed
US-20110028587-A1 CURABLE COMPOSITION, COLOR FILTER AND PROCESS FOR PRODUCTION THEREOF, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20110026153-A1 COLOR FILTER, METHOD FOR PRODUCING THE SAME, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20080286665-A1 COLOR FILTER AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2008-11-20 US disclosed
US-20080206659-A1 COLOR FILTER AND METHOD OF MANUFACTURING THE SAME, AND SOLID-STATE IMAGE PICKUP ELEMENT FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed