SCHEMBL26206418

SCHEMBL26206418

O=C(OC1CCCCC1)c1cc(I)ccc1Oc1c(F)c(F)c(S)c(F)c1F

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 2/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ NPC1 O15118 1/20 0.36
▸ RAB9A P51151 1/20 0.36
▸ MMP9 P14780 2/20 0.33
▸ MMP12 P39900 2/20 0.33
▸ PTGDR2 Q9Y5Y4 2/20 0.33
▸ MMP1 P03956 1/20 0.33
▸ SCN1A P35498 1/20 0.32
▸ SCN2A Q99250 1/20 0.32
▸ SCN3A Q9NY46 1/20 0.32
▸ MMP2 P08253 1/20 0.32
▸ STS P08842 3/20 0.32
▸ LMNA P02545 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ SMN1; SMN2 Q16637 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ PTPN2 P17706 1/20 0.32
▸ PTPN1 P18031 1/20 0.32
▸ TP53 P04637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26206415 0.89 PDE4D (0.34) MEN1KMT2ASCN1ASCN2ASCN3A
SCHEMBL26206416 0.85 PDE4D (0.35) —
SCHEMBL26206440 0.77 KDM4E (0.33) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL26206450 0.77 CA12 (0.36) NPC1MAPTSMN1; SMN2PTPN1ALDH1A1
SCHEMBL26208675 0.77 TSHR (0.38) MEN1KMT2ALMNAMAPTSMN1; SMN2
SCHEMBL24361197 0.74 SCN8A (0.38) MEN1KMT2ANPC1RAB9AMMP9
SCHEMBL26206426 0.73 — —
SCHEMBL26208688 0.72 HTR3A (0.34) PTPN2PTPN1
SCHEMBL26208670 0.69 KDM4E (0.34) MAPT
SCHEMBL7593299 0.68 NPC1 (0.42) MEN1KMT2ANPC1RAB9AMMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162565-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-08-31 — — WO disclosed
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