SCHEMBL26206416

SCHEMBL26206416

O=C(OC1CCOC1)c1cc(I)ccc1Oc1c(F)c(F)c(S)c(F)c1F

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ PDE4D Q08499 16/20 0.35
▸ PDE4A P27815 10/20 0.35
▸ PDE4B Q07343 10/20 0.35
▸ PDE4C Q08493 10/20 0.35
▸ HTR3A P46098 4/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26206415 0.94 PDE4D (0.34) PDE4DPDE4APDE4BPDE4CHTR3A
SCHEMBL26206418 0.85 MEN1 (0.36) —
SCHEMBL26208688 0.80 HTR3A (0.34) HTR3A
SCHEMBL26208675 0.75 TSHR (0.38) —
SCHEMBL26206450 0.74 CA12 (0.36) —
SCHEMBL26206426 0.72 — —
SCHEMBL26206440 0.72 KDM4E (0.33) —
SCHEMBL26206448 0.69 — —
SCHEMBL26208670 0.69 KDM4E (0.34) —
SCHEMBL26206434 0.67 HTR3A (0.33) HTR3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162565-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-08-31 — — WO disclosed
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