SCHEMBL26206434

SCHEMBL26206434

C=[SH]c1c(F)c(F)c(Oc2c(I)cc(I)cc2C(=O)OC2CCOCC2)c(F)c1F

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ HTR3A P46098 4/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26208688 0.86 HTR3A (0.34) HTR3A
SCHEMBL26206415 0.71 PDE4D (0.34) HTR3A
SCHEMBL26206416 0.67 PDE4D (0.35) HTR3A
SCHEMBL26206448 0.65 — —
SCHEMBL26939036 0.62 LMNA (0.39) HTR3A
SCHEMBL7592464 0.60 SERPINE1 (0.41) HTR3A
SCHEMBL19678540 0.60 — —
SCHEMBL26206418 0.60 MEN1 (0.36) —
SCHEMBL23559459 0.60 NPC1 (0.34) HTR3A
SCHEMBL7593244 0.59 SERPINE1 (0.44) HTR3A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162565-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-08-31 — — WO disclosed
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