⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26206432 | 0.92 | — | — | |
| SCHEMBL26208675 | 0.69 | TSHR (0.38) | — | |
| SCHEMBL26206418 | 0.69 | MEN1 (0.36) | — | |
| SCHEMBL26206450 | 0.68 | CA12 (0.36) | — | |
| SCHEMBL26206415 | 0.67 | PDE4D (0.34) | — | |
| SCHEMBL26206426 | 0.66 | — | — | |
| SCHEMBL26206440 | 0.66 | KDM4E (0.33) | — | |
| SCHEMBL26206416 | 0.66 | PDE4D (0.35) | — | |
| SCHEMBL26208670 | 0.61 | KDM4E (0.34) | — | |
| SCHEMBL19756081 | 0.56 | KDM4E (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023162565-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |