SCHEMBL26343111

SCHEMBL26343111

O=C(OCCC(F)(F)C(=O)O)c1ccc(I)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.42
▸ LMNA P02545 3/20 0.40
▸ TPMT P51580 1/20 0.40
▸ ESR1 P03372 4/20 0.39
▸ TSHR P16473 3/20 0.39
▸ ALDH1A1 P00352 1/20 0.39
▸ CHRM1 P11229 1/20 0.39
▸ SLC6A2 P23975 1/20 0.39
▸ KDR P35968 1/20 0.39
▸ ESR2 Q92731 1/20 0.39
▸ TRPV1 Q8NER1 2/20 0.38
▸ RAB9A P51151 2/20 0.38
▸ NPC1 O15118 1/20 0.38
▸ MAPK1 P28482 2/20 0.38
▸ HIF1A Q16665 1/20 0.38
▸ CYP1A2 P05177 2/20 0.37
▸ CYP2C19 P33261 2/20 0.37
▸ CYP2D6 P10635 1/20 0.37
▸ NR1H2 P55055 1/20 0.37
▸ RNASEL Q05823 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26343108 0.85 TDP1 (0.59) TDP1LMNAESR1TSHRALDH1A1
SCHEMBL23559299 0.84 MAPK1 (0.47) TDP1LMNATPMTESR1SLC6A2
SCHEMBL26343114 0.82 TDP1 (0.41) TDP1LMNATSHRALDH1A1SLC6A2
SCHEMBL24268496 0.80 STS (0.36) TDP1LMNAESR1TSHRALDH1A1
SCHEMBL24142380 0.74 ESR1 (0.38) TDP1LMNATPMTESR1TSHR
SCHEMBL26343120 0.74 HDAC3 (0.36) ESR1
SCHEMBL17073088 0.73 MAPK1 (0.49) TDP1LMNAESR1TSHRALDH1A1
SCHEMBL24305508 0.73 ESR1 (0.46) TDP1LMNATPMTESR1TSHR
SCHEMBL29083864 0.73 ESR1 (0.46) TDP1LMNATPMTESR1TSHR
SCHEMBL10488203 0.73 ALDH1A1 (0.70) TDP1LMNAESR1TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
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