SCHEMBL26355391

SCHEMBL26355391

CCC(C)(C)C(=O)Oc1cc(I)c(O)cc1I

nearest known ligand 0.33

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 1/20 0.33
▸ ELANE P08246 1/20 0.32
▸ MTNR1A P48039 1/20 0.31
▸ MTNR1B P49286 1/20 0.31
▸ MEN1 O00255 1/20 0.30
▸ ALDH1A1 P00352 1/20 0.30
▸ TP53 P04637 1/20 0.30
▸ CYP1A2 P05177 1/20 0.30
▸ CYP3A4 P08684 1/20 0.30
▸ CYP2D6 P10635 1/20 0.30
▸ HPGD P15428 1/20 0.30
▸ TSHR P16473 1/20 0.30
▸ MAPK1 P28482 1/20 0.30
▸ KMT2A Q03164 1/20 0.30
▸ TRPV1 Q8NER1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27255699 0.81 ACHE (0.32) ELANE
SCHEMBL26355357 0.77 ESR1 (0.43) ESR1ELANEMEN1ALDH1A1CYP1A2
SCHEMBL25468121 0.74 ELANE (0.44) ELANEALDH1A1
SCHEMBL26355387 0.74 ELANE (0.37) ESR1ELANEMEN1ALDH1A1TP53
SCHEMBL25454481 0.73 MAOB (0.46) ESR1ELANEALDH1A1HPGD
SCHEMBL15395813 0.73 VDR (0.36) ESR1ELANEALDH1A1CYP1A2CYP3A4
SCHEMBL13212295 0.72 ELANE (0.45) ELANEALDH1A1TP53TSHRMAPK1
SCHEMBL21701054 0.72 TTR (0.34) ELANE
SCHEMBL26453057 0.72 ELANE (0.41) ELANEMTNR1AMTNR1BMEN1KMT2A
SCHEMBL25468115 0.72 KDM4E (0.30) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern RER1, AFF1, AFF4 ESR1 254/4885ELANE 2166/4885MTNR1A 629/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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