SCHEMBL26413388

SCHEMBL26413388

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(Cl)c([N+](=O)[O-])c1

nearest known ligand 0.51

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
VCAM1 P19320 2/20 0.51
SMN1; SMN2 Q16637 6/20 0.45
KMT2A Q03164 5/20 0.45
MEN1 O00255 4/20 0.45
L3MBTL1 Q9Y468 2/20 0.45
MAPT P10636 6/20 0.44
ALDH1A1 P00352 4/20 0.44
LMNA P02545 3/20 0.42
MAPK1 P28482 2/20 0.42
RAF1 P04049 1/20 0.42
HPGD P15428 1/20 0.42
GFER P55789 1/20 0.42
PAX8 Q06710 1/20 0.42
NPC1 O15118 2/20 0.41
MITF O75030 2/20 0.41
HTT P42858 2/20 0.41
NPSR1 Q6W5P4 2/20 0.41
RAB9A P51151 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413414 0.90 CASP6 (0.46) VCAM1SMN1; SMN2KMT2AMEN1MAPT
SCHEMBL26413389 0.89 VCAM1 (0.39) VCAM1SMN1; SMN2KMT2AMEN1L3MBTL1
SCHEMBL26413430 0.88 KMT2A (0.39) VCAM1SMN1; SMN2KMT2AMEN1L3MBTL1
SCHEMBL26413557 0.87 CES2 (0.51) SMN1; SMN2KMT2AMEN1MAPTALDH1A1
SCHEMBL26478650 0.87 MAPT (0.46) VCAM1KMT2AMEN1MAPTALDH1A1
SCHEMBL26413428 0.86 GPR35 (0.36) VCAM1KMT2AMAPK1
SCHEMBL26413561 0.85 GAA (0.52) SMN1; SMN2KMT2AMEN1L3MBTL1MAPT
SCHEMBL26413409 0.85 SLC6A2 (0.41) MAPTALDH1A1
SCHEMBL24944251 0.85 MAPT (0.37) KMT2AMAPTALDH1A1LMNAMAPK1
SCHEMBL26413553 0.85 TSHR (0.49) SMN1; SMN2KMT2AMEN1L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR VCAM1 2807/4885SMN1; SMN2 1285/4885KMT2A 1033/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.