SCHEMBL26413601

SCHEMBL26413601

O=C(COc1ccccc1[N+](=O)[O-])OC1(c2ccccc2)CCNCC1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.51
KMT2A Q03164 4/20 0.51
MEN1 O00255 1/20 0.51
HTT P42858 1/20 0.48
KDM4E B2RXH2 2/20 0.47
SMN1; SMN2 Q16637 1/20 0.46
CTDSP1 Q9GZU7 1/20 0.45
NPC1 O15118 3/20 0.44
RAB9A P51151 3/20 0.44
RECQL P46063 1/20 0.44
POLB P06746 2/20 0.43
ATM Q13315 1/20 0.43
SENP8 Q96LD8 1/20 0.43
SENP7 Q9BQF6 1/20 0.43
SENP6 Q9GZR1 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
GAA P10253 1/20 0.43
GBA1 P04062 1/20 0.42
MAPK1 P28482 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413607 0.82 ALDH1A1 (0.47) ALDH1A1KMT2AKDM4ESMN1; SMN2NPC1
SCHEMBL26413612 0.82 ALDH1A1 (0.43) ALDH1A1KMT2AMEN1SMN1; SMN2NPC1
SCHEMBL24944846 0.81 MEN1 (0.43) ALDH1A1KMT2AMEN1HTTKDM4E
SCHEMBL24943733 0.81 POLB (0.50) ALDH1A1KMT2AMEN1SMN1; SMN2NPC1
SCHEMBL24944105 0.81 ALDH1A1 (0.38) ALDH1A1KMT2AMEN1HTTKDM4E
SCHEMBL26413598 0.80 ALDH1A1 (0.41) ALDH1A1KMT2AMEN1CTDSP1NPC1
SCHEMBL24944710 0.80 ALDH1A1 (0.52) ALDH1A1KMT2AMEN1HTTKDM4E
SCHEMBL24944273 0.80 PARP1 (0.43) ALDH1A1KMT2AMEN1HTTKDM4E
SCHEMBL24944608 0.80 OPRM1 (0.44) ALDH1A1KMT2AMEN1L3MBTL1GAA
SCHEMBL26413453 0.78 ALDH1A1 (0.41) ALDH1A1KMT2AKDM4ESMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885KMT2A 1033/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.