SCHEMBL24944273

SCHEMBL24944273

NC(=O)c1ccccc1OCC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.52

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 6/20 0.43
ALDH1A1 P00352 1/20 0.43
KDM4E B2RXH2 2/20 0.43
HTT P42858 2/20 0.43
MAPT P10636 3/20 0.43
RAB9A P51151 1/20 0.41
POLB P06746 1/20 0.41
KMT2A Q03164 3/20 0.40
MEN1 O00255 2/20 0.40
LMNA P02545 2/20 0.40
NR1I2 O75469 1/20 0.40
CHRM2 P08172 1/20 0.40
CYP3A4 P08684 1/20 0.40
ADRA2A P08913 1/20 0.40
OPRK1 P41145 1/20 0.40
HTR2B P41595 1/20 0.40
SLC6A3 Q01959 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
CTNNB1 P35222 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943733 0.86 POLB (0.50) ALDH1A1MAPTRAB9APOLBKMT2A
SCHEMBL24944846 0.83 MEN1 (0.43) ALDH1A1KDM4EHTTMAPTRAB9A
SCHEMBL24944710 0.81 ALDH1A1 (0.52) ALDH1A1KDM4EHTTMAPTKMT2A
SCHEMBL24944608 0.81 OPRM1 (0.44) ALDH1A1KMT2AMEN1OPRK1
SCHEMBL26413601 0.80 ALDH1A1 (0.51) ALDH1A1KDM4EHTTRAB9APOLB
SCHEMBL26413623 0.79 OPRM1 (0.41) PARP1ALDH1A1KDM4EMAPTCTNNB1
SCHEMBL24944596 0.77 OPRM1 (0.48) ALDH1A1OPRK1
SCHEMBL24943648 0.77 TDP1 (0.50) ALDH1A1HTTMAPTRAB9APOLB
SCHEMBL26478741 0.76 GPR183 (0.44) ALDH1A1HTTMAPTRAB9APOLB
SCHEMBL24944034 0.76 OPRM1 (0.48) OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR PARP1 924/4885ALDH1A1 4767/4885KDM4E 1069/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.