SCHEMBL26413609

SCHEMBL26413609

O=C(Cc1ccc([N+](=O)[O-])cc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
KDM4E B2RXH2 1/20 0.44
MAPT P10636 2/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
ADRA1D P25100 1/20 0.42
ADRA1A P35348 1/20 0.42
ADRA1B P35368 1/20 0.42
RECQL P46063 1/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
GAA P10253 1/20 0.41
RAB9A P51151 1/20 0.41
SIGMAR1 Q99720 1/20 0.41
CYP1A2 P05177 1/20 0.40
CYP2C19 P33261 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413726 0.89 ALDH1A1 (0.48) ALDH1A1MAPTSMN1; SMN2MEN1KMT2A
SCHEMBL26413610 0.88 SIGMAR1 (0.44) ALDH1A1MAPTSMN1; SMN2MEN1KMT2A
SCHEMBL24944885 0.86 OPRM1 (0.46) ALDH1A1SMN1; SMN2L3MBTL1
SCHEMBL26413607 0.84 ALDH1A1 (0.47) ALDH1A1KDM4EMAPTSMN1; SMN2KMT2A
SCHEMBL24944042 0.84 FNTA (0.43) ALDH1A1L3MBTL1
SCHEMBL24943729 0.84 OPRM1 (0.42) ALDH1A1L3MBTL1
SCHEMBL26413523 0.84 CYP1A2 (0.51) ALDH1A1MAPTKMT2AL3MBTL1SIGMAR1
SCHEMBL26413489 0.83 PTGDR2 (0.43) MAPTMEN1KMT2AL3MBTL1
SCHEMBL26478728 0.83 OPRM1 (0.41) ALDH1A1MAPTSMN1; SMN2L3MBTL1RAB9A
SCHEMBL26413731 0.83 OPRM1 (0.47) SMN1; SMN2KMT2AADRA1DADRA1AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885KDM4E 1069/4885MAPT 2648/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.