SCHEMBL26413610

SCHEMBL26413610

O=C(Cc1cccc([N+](=O)[O-])c1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.44
ALDH1A1 P00352 6/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
RAB9A P51151 1/20 0.42
MAPT P10636 2/20 0.41
LMNA P02545 2/20 0.41
OPRK1 P41145 1/20 0.41
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
HTT P42858 2/20 0.40
AGTR1 P30556 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
PDE1C Q14123 1/20 0.39
PTPN1 P18031 1/20 0.39
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413720 0.89 ALDH1A1 (0.48) SIGMAR1ALDH1A1SMN1; SMN2RAB9AMAPT
SCHEMBL26413609 0.88 ALDH1A1 (0.48) SIGMAR1ALDH1A1SMN1; SMN2RAB9AMAPT
SCHEMBL24944885 0.83 OPRM1 (0.46) ALDH1A1SMN1; SMN2OPRK1L3MBTL1TSHR
SCHEMBL26413598 0.83 ALDH1A1 (0.41) ALDH1A1RAB9AMAPTLMNAMEN1
SCHEMBL26413523 0.83 CYP1A2 (0.51) SIGMAR1ALDH1A1MAPTKMT2ACYP1A2
SCHEMBL24944886 0.83 TACR1 (0.41) SIGMAR1OPRK1
SCHEMBL26413709 0.82 TACR1 (0.46) SIGMAR1ALDH1A1CYP1A2L3MBTL1
SCHEMBL26413516 0.82 MEN1 (0.43) ALDH1A1SMN1; SMN2MAPTLMNAMEN1
SCHEMBL26413712 0.82 L3MBTL1 (0.39) ALDH1A1SMN1; SMN2RAB9AMEN1KMT2A
SCHEMBL24944618 0.82 TACR1 (0.44) SIGMAR1ALDH1A1SMN1; SMN2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SIGMAR1 327/4885ALDH1A1 4767/4885SMN1; SMN2 1285/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.