SCHEMBL26413623

SCHEMBL26413623

NC(=O)c1ccccc1C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.41

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 3/20 0.41
PARP1 P09874 4/20 0.38
PARP2 Q9UGN5 2/20 0.38
CTNNB1 P35222 1/20 0.36
OPRL1 P41146 1/20 0.35
HTR2A P28223 1/20 0.35
BCAT2 O15382 1/20 0.35
KDM4E B2RXH2 1/20 0.34
ALDH1A1 P00352 1/20 0.34
MAPT P10636 1/20 0.34
HPGD P15428 1/20 0.34
TSHR P16473 1/20 0.34
HSD17B10 Q99714 1/20 0.34
DPP9 Q86TI2 1/20 0.34
DPP7 Q9UHL4 1/20 0.34
TACR1 P25103 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413472 0.86 ALDH1A1 (0.44) OPRM1HTR2AKDM4EALDH1A1MAPT
SCHEMBL24944073 0.86 OPRM1 (0.44) OPRM1OPRL1HTR2AALDH1A1TACR1
SCHEMBL24944349 0.85 AKR1C3 (0.42) OPRM1ALDH1A1MAPTTSHRHSD17B10
SCHEMBL24944623 0.84 RXFP1 (0.46) OPRM1ALDH1A1HPGD
SCHEMBL24944311 0.84 HPGD (0.44) OPRM1HTR2AKDM4EALDH1A1MAPT
SCHEMBL26413644 0.83 PARP10 (0.44) OPRM1PARP1OPRL1HTR2AMAPT
SCHEMBL26478633 0.83 OPRM1 (0.44) OPRM1HTR2AKDM4EALDH1A1MAPT
SCHEMBL24944852 0.83 OPRM1 (0.47) OPRM1HTR2AHPGDTACR1
SCHEMBL26413827 0.82 SCN1A (0.51) OPRM1BCAT2TSHR
SCHEMBL23647372 0.82 OPRM1 (0.47) OPRM1HTR2ADPP9DPP7TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885PARP1 924/4885PARP2 1674/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.