SCHEMBL26413644

SCHEMBL26413644

NC(=O)c1ccc(C(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 5/20 0.44
OPRD1 P41143 4/20 0.43
OPRM1 P35372 4/20 0.42
OPRK1 P41145 2/20 0.42
KCNH2 Q12809 2/20 0.42
CYP2D6 P10635 1/20 0.42
POLB P06746 1/20 0.41
CYP3A4 P08684 1/20 0.41
PARP1 P09874 1/20 0.41
MAPT P10636 1/20 0.41
TSHR P16473 1/20 0.41
CYP2C19 P33261 1/20 0.41
RECQL P46063 1/20 0.41
BLM P54132 1/20 0.41
PMP22 Q01453 1/20 0.41
HSD17B10 Q99714 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
HDAC1 Q13547 1/20 0.39
OPRL1 P41146 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943664 0.90 OPRM1 (0.46) OPRM1TSHRHSD17B10TDP1HDAC1
SCHEMBL24943674 0.89 NPC1 (0.43) OPRD1OPRM1OPRK1KCNH2CYP3A4
SCHEMBL24944313 0.87 ESR1 (0.42) OPRD1OPRM1MAPTTSHRTDP1
SCHEMBL26413775 0.87 ALDH1A1 (0.46) OPRD1OPRM1TSHRHSD17B10TDP1
SCHEMBL24943754 0.87 SMN1; SMN2 (0.43) OPRD1OPRM1OPRK1KCNH2CYP2D6
SCHEMBL24944620 0.86 DRD2 (0.43) OPRM1MAPTTSHRL3MBTL1HDAC1
SCHEMBL26478635 0.86 HDAC1 (0.41) OPRD1OPRM1OPRK1KCNH2POLB
SCHEMBL24944081 0.86 OPRM1 (0.44) OPRD1OPRM1OPRK1KCNH2MAPT
SCHEMBL24944860 0.86 OPRM1 (0.47) OPRD1OPRM1OPRK1KCNH2CYP2D6
SCHEMBL26413444 0.86 OPRM1 (0.41) OPRD1OPRM1OPRK1KCNH2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR PARP10 3025/4885OPRD1 1348/4885OPRM1 775/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.