Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB4 | P30926 | 10/20 | 0.56 |
| ▸ | CHRNA3 | P32297 | 10/20 | 0.56 |
| ▸ | CHRNB2 | P17787 | 9/20 | 0.56 |
| ▸ | CHRNA4 | P43681 | 9/20 | 0.56 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.39 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.39 |
| ▸ | IRAK4 | Q9NWZ3 | 1/20 | 0.39 |
| ▸ | HTR4 | Q13639 | 4/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26426646 | 0.86 | HTR4 (0.49) | CHRNB4CHRNA3CHRNB2CHRNA4HDAC1 | |
| SCHEMBL21705230 | 0.78 | CHRNB4 (0.55) | CHRNB4CHRNA3CHRNB2CHRNA4HDAC1 | |
| SCHEMBL26427846 | 0.77 | HTR4 (0.38) | HDAC1HDAC2HTR4ACHECHRM3 | |
| SCHEMBL26426645 | 0.76 | CHRM3 (0.43) | CHRNB2CHRNA4CHRM3 | |
| SCHEMBL28255620 | 0.74 | CHRNB4 (0.72) | CHRNB4CHRNA3CHRNB2CHRNA4CHRM3 | |
| SCHEMBL26834873 | 0.74 | CHRM2 (0.37) | HDAC1HDAC2HTR4ACHECHRM3 | |
| SCHEMBL21783772 | 0.73 | HRH3 (0.49) | HTR4 | |
| SCHEMBL21705754 | 0.72 | KMT2A (0.50) | HTR4 | |
| SCHEMBL26427856 | 0.72 | ATM (0.53) | CHRM3 | |
| SCHEMBL22277818 | 0.71 | SLC6A2 (0.34) | CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |