SCHEMBL26426646

SCHEMBL26426646

CN1CCC(COC(=O)c2cc(I)cc(I)c2I)CC1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR4 Q13639 8/20 0.49
CHRNB2 P17787 1/20 0.40
CHRNB4 P30926 1/20 0.40
CHRNA3 P32297 1/20 0.40
CHRNA4 P43681 1/20 0.40
DRD2 P14416 1/20 0.39
DRD4 P21917 1/20 0.39
CARM1 Q86X55 1/20 0.39
PRMT6 Q96LA8 1/20 0.39
HTR2C P28335 2/20 0.39
ADRA2B P18089 1/20 0.39
ADRA2C P18825 1/20 0.39
HTR1D P28221 1/20 0.39
ADRA1A P35348 1/20 0.39
ADRA1B P35368 1/20 0.39
HTR2B P41595 1/20 0.39
HDAC3 O15379 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC2 Q92769 1/20 0.38
HTR3E A5X5Y0 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26427846 0.88 HTR4 (0.38) HTR4HDAC3HDAC1HDAC2
SCHEMBL26426643 0.86 CHRNB4 (0.56) HTR4CHRNB2CHRNB4CHRNA3CHRNA4
SCHEMBL26427856 0.80 ATM (0.53)
SCHEMBL21783772 0.78 HRH3 (0.49) HTR4CYP3A4
SCHEMBL21705229 0.76 HTR4 (0.43) HTR4CHRNB2CHRNB4CHRNA3CHRNA4
SCHEMBL22277451 0.76 ATM (0.33)
SCHEMBL22277826 0.75 ATM (0.33)
SCHEMBL21705288 0.75 HTR4 (0.50) HTR4HTR2CADRA2BADRA2CHTR1D
SCHEMBL22277818 0.74 SLC6A2 (0.34)
SCHEMBL26426645 0.74 CHRM3 (0.43) CHRNB2CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed