SCHEMBL26426645

SCHEMBL26426645

CN1CCCC1CCOC(=O)c1cc(I)cc(I)c1I

nearest known ligand 0.43

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CHRM3 P20309 17/20 0.43
CHRNB2 P17787 3/20 0.43
CHRNA7 P36544 3/20 0.43
CHRNA4 P43681 3/20 0.43
CHRNA5 P30532 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26427846 0.82 HTR4 (0.38) CHRM3
SCHEMBL26834873 0.79 CHRM2 (0.37) CHRM3
SCHEMBL21705920 0.78 CHRNB2 (0.47) CHRM3CHRNB2CHRNA7CHRNA4CHRNA5
SCHEMBL21705754 0.77 KMT2A (0.50)
SCHEMBL26426643 0.76 CHRNB4 (0.56) CHRM3CHRNB2CHRNA4
SCHEMBL21705213 0.76 KMT2A (0.52)
SCHEMBL21783772 0.75 HRH3 (0.49)
SCHEMBL26426652 0.74 GPR119 (0.47)
SCHEMBL26426646 0.74 HTR4 (0.49) CHRNB2CHRNA4
SCHEMBL26426644 0.74 PIM1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed