SCHEMBL26426913

SCHEMBL26426913

O=C(OC1(c2ccccc2)CCNCC1)c1cc(I)cc(I)c1O

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ OPRM1 P35372 2/20 0.36
▸ TACR1 P25103 3/20 0.35
▸ HDAC1 Q13547 1/20 0.31
▸ HTR2A P28223 1/20 0.31
▸ DPP9 Q86TI2 1/20 0.30
▸ DPP7 Q9UHL4 1/20 0.30
▸ TTR P02766 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426914 0.96 OPRM1 (0.34) OPRM1TACR1
SCHEMBL26426918 0.93 HTR2A (0.35) OPRM1TACR1HTR2A
SCHEMBL26426916 0.93 OPRM1 (0.33) OPRM1TACR1
SCHEMBL26426932 0.92 TTR (0.31) TTR
SCHEMBL26426881 0.89 OPRM1 (0.37) OPRM1TACR1HDAC1HTR2A
SCHEMBL26426965 0.89 OPRM1 (0.35) OPRM1TACR1
SCHEMBL26426928 0.88 MEN1 (0.39) —
SCHEMBL26426925 0.88 DPP4 (0.33) TTR
SCHEMBL26426931 0.88 — —
SCHEMBL26426927 0.88 USP2 (0.34) OPRM1TACR1TTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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