SCHEMBL26426918

SCHEMBL26426918

O=C(OC1(c2ccccc2)CCNC1)c1cc(I)cc(I)c1O

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ HTR2A P28223 1/20 0.35
▸ OPRM1 P35372 2/20 0.33
▸ TACR1 P25103 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426922 0.93 SLC6A9 (0.32) HTR2ATACR1
SCHEMBL26426913 0.93 OPRM1 (0.36) HTR2AOPRM1TACR1
SCHEMBL26426887 0.90 HTR2A (0.35) HTR2AOPRM1TACR1
SCHEMBL26426914 0.89 OPRM1 (0.34) OPRM1TACR1
SCHEMBL26426916 0.86 OPRM1 (0.33) OPRM1TACR1
SCHEMBL26426932 0.85 TTR (0.31) —
SCHEMBL26426890 0.83 SLC6A9 (0.32) HTR2AOPRM1TACR1
SCHEMBL26426881 0.82 OPRM1 (0.37) HTR2AOPRM1TACR1
SCHEMBL26426931 0.82 — —
SCHEMBL26426925 0.82 DPP4 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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