SCHEMBL26426925

SCHEMBL26426925

O=C(OC1(c2ccc(F)cc2)CCNCC1)c1cc(I)cc(I)c1O

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ DPP4 P27487 1/20 0.33
▸ TTR P02766 1/20 0.32
▸ DRD2 P14416 1/20 0.31
▸ DRD4 P21917 1/20 0.31
▸ DRD3 P35462 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426932 0.92 TTR (0.31) TTR
SCHEMBL26426893 0.90 DRD2 (0.32) DPP4DRD2DRD4DRD3
SCHEMBL26426931 0.89 — —
SCHEMBL26426928 0.89 MEN1 (0.39) DRD2DRD4DRD3
SCHEMBL26426913 0.88 OPRM1 (0.36) TTR
SCHEMBL26426927 0.88 USP2 (0.34) DPP4TTR
SCHEMBL26426926 0.88 MMP2 (0.34) —
SCHEMBL26426914 0.84 OPRM1 (0.34) —
SCHEMBL26426916 0.82 OPRM1 (0.33) —
SCHEMBL26426903 0.81 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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