SCHEMBL26426932

SCHEMBL26426932

O=C(OC1(c2ccc(I)cc2)CCNCC1)c1cc(I)cc(I)c1O

nearest known ligand 0.40

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
▸ TTR P02766 1/20 0.31
▸ MEN1 O00255 1/20 0.30
▸ HSPD1 P10809 1/20 0.30
▸ PNLIP P16233 1/20 0.30
▸ PIK3CA P42336 1/20 0.30
▸ HTT P42858 1/20 0.30
▸ BLM P54132 1/20 0.30
▸ HSPE1 P61604 1/20 0.30
▸ KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426925 0.92 DPP4 (0.33) TTR
SCHEMBL26426931 0.92 — —
SCHEMBL26426928 0.92 MEN1 (0.39) MEN1HSPD1PNLIPPIK3CAHTT
SCHEMBL26426913 0.92 OPRM1 (0.36) TTR
SCHEMBL26426903 0.89 — —
SCHEMBL26426926 0.89 MMP2 (0.34) —
SCHEMBL26426914 0.88 OPRM1 (0.34) —
SCHEMBL26426918 0.85 HTR2A (0.35) —
SCHEMBL26426916 0.85 OPRM1 (0.33) —
SCHEMBL26426927 0.84 USP2 (0.34) TTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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