SCHEMBL26444367

SCHEMBL26444367

CCC(C)(C)C(=O)OCc1ccc2cc3ccccc3cc2c1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 2/20 0.44
CYP1A2 P05177 2/20 0.41
CYP2A6 P11509 1/20 0.41
SLC1A3 P43003 1/20 0.40
SLC1A2 P43004 1/20 0.40
SLC1A1 P43005 1/20 0.40
RIPK1 Q13546 1/20 0.40
TACR1 P25103 2/20 0.39
FKBP1A P62942 1/20 0.39
MMP1 P03956 1/20 0.38
MMP9 P14780 1/20 0.38
MMP13 P45452 1/20 0.38
RAB9A P51151 1/20 0.38
MAOB P27338 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13823922 0.96 ALOX5 (0.47) ALOX5CYP1A2CYP2A6SLC1A3SLC1A2
SCHEMBL12123084 0.87 PPARG (0.39) ALOX5CYP1A2RIPK1RAB9A
SCHEMBL14905850 0.87 CYP2C9 (0.42) ALOX5SLC1A3SLC1A2SLC1A1
SCHEMBL18961213 0.85 ALOX5 (0.44) ALOX5CYP1A2CYP2A6SLC1A3SLC1A2
SCHEMBL12128708 0.84 PTPN1 (0.42) ALOX5CYP1A2CYP2A6SLC1A3SLC1A2
SCHEMBL26444355 0.83 MEN1 (0.39) ALOX5RIPK1TACR1MAOB
SCHEMBL25005847 0.82 SLC1A3 (0.47) ALOX5CYP1A2CYP2A6SLC1A3SLC1A2
SCHEMBL13292523 0.81 MTNR1A (0.42) RIPK1
SCHEMBL116845 0.80 ALDH1A1 (0.56) RIPK1RAB9A
SCHEMBL12128697 0.79 ALOX5 (0.46) ALOX5CYP1A2CYP2A6SLC1A3SLC1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240219834-A1 METHOD FOR FORMING A RESIST PATTERN NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-20240219834-A1 METHOD FOR FORMING A RESIST PATTERN NISSAN CHEMICAL CORPORATION (JP) 2024-07-04 US disclosed
US-20230131253-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT NISSAN CHEMICAL CORPORATION (JP) 2023-04-27 US disclosed