Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26489429 | 0.84 | NPSR1 (0.44) | NPSR1ALDH1A1RXFP1MEN1MAPT | |
| SCHEMBL9893796 | 0.84 | ALDH1A1 (0.43) | NPSR1ALDH1A1MEN1MAPTKMT2A | |
| SCHEMBL9924177 | 0.77 | ALDH1A1 (0.42) | NPSR1ALDH1A1MEN1MAPTKMT2A | |
| SCHEMBL19261615 | 0.75 | EPHX1 (0.42) | NPSR1ALDH1A1MEN1MAPTKMT2A | |
| SCHEMBL9925523 | 0.75 | EPHX1 (0.42) | NPSR1ALDH1A1MEN1MAPTKMT2A | |
| SCHEMBL9946445 | 0.75 | EPHX1 (0.42) | NPSR1ALDH1A1MEN1MAPTKMT2A | |
| SCHEMBL9894463 | 0.72 | RECQL (0.44) | NPSR1ALDH1A1MAPTKMT2ALMNA | |
| SCHEMBL19796149 | 0.71 | ALDH1A1 (0.46) | NPSR1ALDH1A1MEN1MAPTKMT2A | |
| SCHEMBL23843754 | 0.70 | NPSR1 (0.31) | NPSR1ALDH1A1 | |
| SCHEMBL775846 | 0.70 | TSHR (0.44) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |