Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 11/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.43 |
| ▸ | PRKCA | P17252 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9924177 | 0.92 | ALDH1A1 (0.42) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL9925523 | 0.90 | EPHX1 (0.42) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL9946445 | 0.90 | EPHX1 (0.42) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL19261615 | 0.90 | EPHX1 (0.42) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL9894463 | 0.87 | RECQL (0.44) | ALDH1A1KMT2ANPSR1MAPTRECQL | |
| SCHEMBL19796149 | 0.86 | ALDH1A1 (0.46) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL26489441 | 0.84 | NPSR1 (0.42) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL26489429 | 0.83 | NPSR1 (0.44) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL9924198 | 0.81 | EPHX2 (0.48) | ALDH1A1KMT2ANPSR1MAPTMEN1 | |
| SCHEMBL10264011 | 0.78 | ALDH1A1 (0.39) | ALDH1A1KMT2ANPSR1MAPTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026100367-A1 | RESIST MATERIAL AND PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20240337928-A1 | ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME AND METHOD OF FORMING PATTERN BY USING THE PHOTORESIST PATTERN | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-10-10 | — | — | US | disclosed |
| US-20240201588-A1 | ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-06-20 | — | — | US | disclosed |
| US-20230375924-A1 | EUV Metallic Resist Performance Enhancement Via Additives | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-23 | — | — | US | disclosed |
| US-20230375924-A1 | EUV Metallic Resist Performance Enhancement Via Additives | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-23 | — | — | US | disclosed |
| US-20230268178-A1 | PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-08-24 | — | — | US | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230132653-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230131429-A1 | PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-04-27 | — | — | US | disclosed |
| US-20230131429-A1 | PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-04-27 | — | — | US | disclosed |
| US-20120264058-A1 | RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120214101-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120214101-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20120164578-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120164578-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120148956-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120148956-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120149916-A1 | NOVEL COMPOUND | CENTRAL GLASS CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120148956-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120149916-A1 | NOVEL COMPOUND | CENTRAL GLASS CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240201588-A1 | ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME | OR10J3, RER1, S100A11 | ALDH1A1 1564/4885KMT2A 1532/4885NPSR1 1182/4885 |
| US-20120149916-A1 | NOVEL COMPOUND | MRPL11, ABCB7, MRPL21 | ALDH1A1 1340/4885KMT2A 3079/4885NPSR1 3069/4885 |
| US-20230131429-A1 | PHOTO-DECOMPOSABLE COMPOUND, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | C9, ERCC1, SMARCC2 | ALDH1A1 3796/4885KMT2A 2675/4885NPSR1 4385/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.