Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDH1 | P40925 | 1/20 | 0.34 |
| ▸ | MDH2 | P40926 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.31 |
| ▸ | CNR1 | P21554 | 2/20 | 0.31 |
| ▸ | CNR2 | P34972 | 2/20 | 0.31 |
| ▸ | ABL1 | P00519 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3822751 | 0.86 | GLA (0.35) | ALDH1A1SCN9ATSHR | |
| SCHEMBL3471342 | 0.84 | SCN9A (0.35) | ALDH1A1SCN9AHSD11B1 | |
| SCHEMBL14979070 | 0.82 | MDH1 (0.32) | MDH1MDH2PKMHSD11B1 | |
| SCHEMBL786658 | 0.75 | PKM (0.34) | MDH1MDH2ALDH1A1SCN9APKM | |
| SCHEMBL18195869 | 0.73 | PKM (0.33) | MDH1MDH2ALDH1A1PKMHSD11B1 | |
| SCHEMBL15014426 | 0.72 | — | — | |
| SCHEMBL776275 | 0.72 | CYP17A1 (0.36) | MDH1MDH2ALDH1A1PKMHSD11B1 | |
| SCHEMBL776064 | 0.72 | CYP17A1 (0.36) | MDH1MDH2ALDH1A1PKMHSD11B1 | |
| SCHEMBL12094572 | 0.71 | PKM (0.31) | PKMHSD11B1 | |
| SCHEMBL17068038 | 0.71 | SCN9A (0.40) | ALDH1A1SCN9AABL1TSHRRIN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210238342-A1 | PROCESSES FOR PRODUCING VISCOUS EPOXY SYRUPS AND EPOXY SYRUPS OBTAINABLE THEREBY | TESA SE (DE) | 2021-08-05 | — | — | US | disclosed |
| US-10876021-B2 | Adhesive having water vapour barrier properties comprising incipiently polymerized epoxy syrup | TESA SE (DE) | 2020-12-29 | — | — | US | disclosed |
| CN-108659223-B | Cyclodextrin derivative type photosensitive resin, preparation method thereof, resist composition based on cyclodextrin derivative type photosensitive resin and application of resist composition | 中科院广州化学有限公司南雄材料生产基地 | 2020-12-04 | — | — | CN | disclosed |
| US-10711087-B2 | Processes for producing viscous epoxy syrups | TESA SE (DE) | 2020-07-14 | — | — | US | disclosed |
| US-20160355712-A1 | ADHESIVE HAVING WATER VAPOUR BARRIER PROPERTIES COMPRISING INCIPIENTLY POLYMERIZED EPOXY SYRUP | TESA SE (DE) | 2016-12-08 | — | — | US | disclosed |
| US-20160355634-A1 | PROCESSES FOR PRODUCING VISCOUS EPOXY SYRUPS AND EPOXY SYRUPS OBTAINABLE THEREBY | TESA SE (DE) | 2016-12-08 | — | — | US | disclosed |
| US-9146466-B2 | Resist composition, resist pattern-forming method, and resist solvent | JSR CORPORATION (JP) | 2015-09-29 | — | — | US | disclosed |
| US-20140302438-A1 | RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, AND RESIST SOLVENT | JSR CORPORATION (JP) | 2014-10-09 | — | — | US | disclosed |
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-8329377-B2 | Imide compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-12-11 | — | — | US | disclosed |
| US-8173350-B2 | Oxime compound and resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8071270-B2 | Polyhydric compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-06 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100028807-A1 | Imide Compound and Chemically Amplified Resist Composition Containing The Same | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20100021847-A1 | Oxime Compound and Resist Composition Containing the Same | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7494763-B2 | Polyhydric phenol compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20080248417-A1 | Polyhydric phenol compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-10-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080248417-A1 | Polyhydric phenol compound and chemically amplified resist composition containing the same | CCNA1, C1R, CCNA2 | MDH1 4251/4885MDH2 3110/4885ALDH1A1 2758/4885 |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | C5, C1R, H1-4 | MDH1 4336/4885MDH2 3627/4885ALDH1A1 2633/4885 |
| US-20100028807-A1 | Imide Compound and Chemically Amplified Resist Composition Containing The Same | IGF1R, CCNA1, MYC | MDH1 4062/4885MDH2 2859/4885ALDH1A1 386/4885 |
| US-20100021847-A1 | Oxime Compound and Resist Composition Containing the Same | CYC1, UQCRB, CBR1 | MDH1 2573/4885MDH2 889/4885ALDH1A1 1280/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.