Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | NAAA | Q02083 | 1/20 | 0.31 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2678411 | 0.86 | MDH1 (0.34) | SCN9AALDH1A1TSHR | |
| SCHEMBL3471342 | 0.83 | SCN9A (0.35) | SCN9AALDH1A1 | |
| SCHEMBL17068034 | 0.78 | CYP19A1 (0.39) | GLACA2CA12CA7CA9 | |
| SCHEMBL29590174 | 0.76 | NPSR1 (0.38) | NPSR1CYP17A1CYP19A1 | |
| Adamantane SCHEMBL547077 | 0.73 | ALDH1A1 (0.40) | GLACA2CA12CA7CA9 | |
| SCHEMBL24361796 | 0.73 | GLA (0.46) | GLANPSR1P2RX7ALDH1A1EPHX1 | |
| SCHEMBL28484451 | 0.72 | SCN9A (0.33) | CA2CA9MMP2MMP9SCN9A | |
| SCHEMBL10168175 | 0.71 | CYP19A1 (0.41) | CA2CA12CA7CA9CA14 | |
| SCHEMBL31005120 | 0.70 | NPSR1 (0.36) | NPSR1 | |
| SCHEMBL686582 | 0.70 | CYP19A1 (0.40) | CA2NPSR1EPHX2CYP17A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106244066-A | There is the water vapor barrier property adhesive of epoxide slurry through initial polymerization | 德莎欧洲公司 | 2016-12-21 | — | — | CN | disclosed |
| CN-106244067-A | The method preparing viscous epoxy compound slurry and the epoxide slurry obtained according to the method | 德莎欧洲公司 | 2016-12-21 | — | — | CN | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-8367298-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-05 | — | — | US | disclosed |
| EP-2033966-A2 | Movel photoacid generators, resist compositons, and patterning processes | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | PROXIMAL SYSTEMS CORPORATION | 2009-03-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | RER1, CRY1, CYP21A2 | GLA 4247/4885CA2 684/4885CA12 422/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.